Sputtering target
    6.
    发明授权

    公开(公告)号:US11569075B2

    公开(公告)日:2023-01-31

    申请号:US16337118

    申请日:2017-09-08

    Applicant: PLANSEE SE

    Abstract: A sputtering target containing molybdenum and at least one metal from the group tantalum and niobium. The average content of tantalum and/or niobium is from 5 to 15 at % and the molybdenum content is greater than or equal to 80 at %. The sputtering target has at least a matrix with an average molybdenum content of greater than or equal to 92 at % and particles which are composed of a solid solution containing at least one metal from the group of tantalum and niobium, and molybdenum, with an average molybdenum content of greater than or equal to 15 at % and are embedded in the matrix. There is also described a method of producing a sputtering target.

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