公开(公告)号：US20190309411A1

公开(公告)日：2019-10-10

申请号：US16393123

申请日：2019-04-24

Applicant: RASIRC, Inc.

Inventor： Jeffrey J. Spiegelman ,  Daniel Alvarez, JR. ,  Jian Yang ,  Russell J. Holmes ,  Edward Heinlein ,  Christopher Ramos ,  Jeremiah Trammel

IPC: C23C16/02 ,  C01B21/068 ,  C01B21/076 ,  C23C16/34 ,  C23C16/455

Abstract: A method and chemical delivery system are provided for low temperature atomic layer deposition. Thus, methods of forming nitrogen-containing thin films by atomic layer deposition using a substantially water free hydrazine gas and plasma treatment are provided.

公开(公告)号：US10214420B2

公开(公告)日：2019-02-26

申请号：US15520031

申请日：2015-10-22

Applicant: RASIRC, Inc.

Inventor： Daniel Alvarez, Jr. ,  Russell J. Holmes ,  Jeffrey Spiegelman ,  Edward Heinlein ,  Christopher Ramos

IPC: B01D19/00 ,  B01D63/06 ,  C01B21/16

Abstract: A method and chemical delivery system and device are provided. One method includes contacting a non-aqueous hydrazine solution with a carrier gas and/or vacuum and delivering a gas stream comprising hydrazine to a critical process or application. One chemical delivery system and device includes a non-aqueous hydrazine solution having a vapor phase that is in contact with a carrier gas and/or vacuum. One device includes a chamber for containing a liquid comprising at least one volatile process chemical, such as a non-aqueous hydrazine solution, a hydrogen peroxide solution, or another suitable process chemical, and a head space from which the volatile can be drawn using a carrier gas and/or vacuum. Another method useful in the present invention involves drawing a process chemical from a device as a disclosed herein using a carrier or vacuum and delivering the process chemical to a critical process or application.

公开(公告)号：US20190247791A1

公开(公告)日：2019-08-15

申请号：US16394380

申请日：2019-04-25

Applicant: RASIRC, Inc.

Inventor： Daniel Alvarez, JR. ,  Russell J. Holmes ,  Jeffrey J. Spiegelman ,  Edward Heinlein ,  Christopher Ramos

IPC: B01D53/86 ,  B01J23/889 ,  B01D53/72 ,  B01J23/94 ,  B01J23/00 ,  B01J38/12 ,  B01J35/02 ,  B01J23/46 ,  B01J23/755 ,  B01J23/72 ,  B01D53/30

CPC classification number: B01D53/8696 ,  B01D53/30 ,  B01D53/72 ,  B01D53/8621 ,  B01D53/8668 ,  B01D53/8671 ,  B01D2251/602 ,  B01D2253/1124 ,  B01D2255/2073 ,  B01D2255/20753 ,  B01D2255/20761 ,  B01D2257/40 ,  B01J23/002 ,  B01J23/468 ,  B01J23/72 ,  B01J23/755 ,  B01J23/8892 ,  B01J23/94 ,  B01J35/026 ,  B01J38/12

Abstract: Provided herein is a device for removing residual hydrogen peroxide or hydrazine from an effluent gas stream which includes a metal oxide scrubber material configured to react with residual process gases under increased temperatures. Also provided are systems and methods of using the same.

公开(公告)号：US20170369315A1

公开(公告)日：2017-12-28

申请号：US15520031

申请日：2015-10-22

Applicant: RASIRC, Inc.

Inventor： Daniel Alvarez, JR. ,  Russell J. Holmes ,  Jeffrey Spiegelman ,  Edward Heinlein ,  Christopher Ramos

IPC: C01B21/16 ,  B01D19/00 ,  B01D63/06

CPC classification number: C01B21/16 ,  B01D19/0031 ,  B01D19/0068 ,  B01D63/06 ,  B01D2325/42

Abstract: A method and chemical delivery system and device are provided. One method includes contacting a non-aqueous hydrazine solution with a carrier gas and/or vacuum and delivering a gas stream comprising hydrazine to a critical process or application. One chemical delivery system and device includes a non-aqueous hydrazine solution having a vapor phase that is in contact with a carrier gas and/or vacuum. One device includes a chamber for containing a liquid comprising at least one volatile process chemical, such as a non-aqueous hydrazine solution, a hydrogen peroxide solution, or another suitable process chemical, and a head space from which the volatile can be drawn using a carrier gas and/or vacuum. Another method useful in the present invention involves drawing a process chemical from a device as a disclosed herein using a carrier or vacuum and delivering the process chemical to a critical process or application.

公开(公告)号：US20170312687A1

公开(公告)日：2017-11-02

申请号：US15582271

申请日：2017-04-28

Applicant: RASIRC, Inc.

Inventor： Daniel Alvarez, JR. ,  Russell J. Holmes ,  Jeffrey J. Spiegelman ,  Edward Heinlein ,  Christopher Ramos

IPC: B01D53/86 ,  B01J35/00 ,  B01J23/889 ,  B01J23/72 ,  B01J23/46 ,  B01J21/04 ,  B01J35/02 ,  B01J38/12 ,  B01J23/755

Abstract: Provided herein is a device for removing residual hydrogen peroxide or hydrazine from an effluent gas stream which includes a metal oxide scrubber material configured to react with residual process gases under increased temperatures. Also provided are systems and methods of using the same.

公开(公告)号：US20200316490A1

公开(公告)日：2020-10-08

申请号：US16464160

申请日：2017-11-16

Applicant: RASIRC, Inc.

Inventor： Christopher Ramos ,  Edward Heinlein ,  Sean Webb ,  Jeffrey Spiegelman ,  Russell Holmes ,  Daniel Alvarez

IPC: B01B1/00 ,  B01D19/00 ,  B01D69/02 ,  C01B15/013

Abstract: Provided herein are methods, systems, and apparatus for inhibiting decomposition of hydrogen peroxide gas through use of surface modification of production and delivery components.

公开(公告)号：US10766771B2

公开(公告)日：2020-09-08

申请号：US15564395

申请日：2016-04-06

Applicant: RASIRC, Inc.

Inventor： Daniel Alvarez, Jr. ,  Christopher Ramos ,  Jeffrey J. Spiegelman

IPC: C01B15/013 ,  B01J47/12 ,  B01J39/20 ,  B01J49/53 ,  B01J3/00 ,  B01J39/18 ,  B01J47/02 ,  C01B15/017 ,  C08L81/08

Abstract: Compositions, methods, devices, and systems for purifying a source liquid from a replenishment stock solution that includes stabilizing agents, such as metal ions, prior to vaporization. Certain embodiments effect the purification with a solid perfluoronated ionomer, such as a perfluoronated ionomer membrane. Advantageously, source liquids purified in this manner provide feed stocks for production of ultra-pure gaseous reagents. As well, performance characteristics of membrane-based vaporizers relying on transport processes are improved.

公开(公告)号：US20190070521A1

公开(公告)日：2019-03-07

申请号：US16181174

申请日：2018-11-05

Applicant: RASIRC, Inc.

Inventor： Daniel Alvarez, JR. ,  Russell J. Holmes ,  Jeffrey J. Spiegelman ,  Edward Heinlein ,  Christopher Ramos ,  Jeremiah Trammel

IPC: B01B1/00 ,  C23C16/448 ,  C01B15/017 ,  B01D19/00

Abstract: Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.

公开(公告)号：US20170216738A1

公开(公告)日：2017-08-03

申请号：US15487924

申请日：2017-04-14

Applicant: RASIRC, Inc.

Inventor： Daniel Alvarez, JR. ,  Russell J. Holmes ,  Jeffrey J. Spiegelman ,  Edward Heinlein ,  Christopher Ramos ,  Jeremiah Trammel

IPC: B01B1/00 ,  C23C16/455

CPC classification number: B01B1/005 ,  B01D19/0031 ,  B01D19/0068 ,  B01D19/0073 ,  C01B15/017 ,  C23C16/448

Abstract: Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.

公开(公告)号：US10994254B2

公开(公告)日：2021-05-04

申请号：US16494448

申请日：2018-03-15

Applicant: RASIRC, Inc.

Inventor： Jeffrey J. Spiegelman ,  Russell Holmes ,  Christopher Ramos

IPC: B01J4/00 ,  B01J8/00 ,  B01J19/00 ,  A61L2/20 ,  A61L2/24

Abstract: Provided herein are methods, systems, and apparatus for measuring and/or controlling mass flow/concentration of a catalytically reactive gas within a mixed gas stream by determining thermal rise due to decomposition.