公开(公告)号：US11622184B2

公开(公告)日：2023-04-04

申请号：US17250590

申请日：2019-08-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jinwoo Kim ,  Sujin Jung ,  Hakrae Kang ,  Heejun Park ,  Minseok Shin ,  Changhwan Lee

IPC: H04R1/04 ,  H05K5/00

Abstract: According to an embodiment of the present invention, an electronic device may comprise: a housing; a printed circuit board disposed inside the housing, the printed circuit board comprising a first surface, a second surface facing away from the first surface, and a first through-hole and a second through-hole penetrating the first surface and the second surface; a first microphone disposed on the second surface so as to at least partially overlap the first through-hole when seen from above the first surface; a second microphone disposed on the second surface so as to at least partially overlap the second through-hole when seen from above the first surface; a support member disposed on the first surface, the support member comprising a third surface facing the first surface, a fourth surface facing away from the third surface, a third through-hole at least partially overlapping the first through-hole when seen from above the first surface, and a fourth through-hole at least partially overlapping the second through-hole when seen from above the first surface; a first sound-transmitting member disposed on the fourth surface so as to at least partially overlap the third through-hole; and a second sound-transmitting member disposed on the fourth surface so as to at least partially overlap the fourth through-hole. Various other embodiments may be included.

公开(公告)号：US12183591B2

公开(公告)日：2024-12-31

申请号：US17701846

申请日：2022-03-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dohoon Kim ,  Wonwoong Chung ,  Taehyung Kim ,  Heejun Park ,  Handuck Song ,  Heonjong Jeong ,  Younglae Kim ,  Byeongok Cho

IPC: H01L21/467 ,  C09K13/00 ,  H01L21/311

Abstract: An etching gas composition includes a first organofluorine compound having 3 to 6 carbon atoms, and an organosulfur compound having 1 to 4 sulfur atoms. The organosulfur compound may include a carbon-fluorine (C—F) bond, a carbon-sulfur (C—S) bond, at least one carbon-carbon double (—C═C—) bond. When the etching gas composition is used, excellent etch selectivity may be obtained, and the linearity and verticality of a pattern may be greatly increased by improving line edge roughness (LER) and line width roughness (LWR) due to an improvement in the roughness of an etched surface.

公开(公告)号：US11473755B2

公开(公告)日：2022-10-18

申请号：US17263702

申请日：2019-08-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Iksu Jung ,  Changjin Yang ,  Changwoo Jung ,  Jinwoo Kim ,  Heejun Park ,  Minseok Shin ,  Sujin Jung

IPC: F21V33/00 ,  F21V13/02 ,  F21V3/00 ,  F21V7/05 ,  F21V11/08 ,  F21V23/04

Abstract: An electronic apparatus according to an embodiment comprises: a housing including a first surface, a second surface facing the first surface, and a third surface which surrounds the inner space between the first surface and the second surface; a support member extending from the housing to the outside of the housing to support the housing; a speaker module arranged in the inner space; a first window arranged between the first surface and the speaker module and including a first light-transmitting surface facing the first surface and a first reflective surface facing away from the first light-transmitting surface; a second window arranged between the first window and the first surface and including a second light-transmitting surface facing the first surface and a second reflective surface facing away from the second light-transmitting surface; a light source module arranged between the first window and the speaker module; and a light diffusion member arranged between the light source module and the first reflective surface. The first window may include a light-transmitting region formed on at least a portion of the first reflective surface, through which light diffused by the light diffusion member transmits. Other embodiments are possible.