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公开(公告)号:US09861918B2
公开(公告)日:2018-01-09
申请号:US14784793
申请日:2014-02-17
Applicant: Sefar AG
Inventor: Isabell Erlenmaier , Christoph Maurer , Christian Gurtner , Christian Dietmayer
CPC classification number: B01D39/08 , B01D33/042 , B01D33/048 , B01D2239/0654 , D03D1/00 , D03D11/00 , D03D13/004 , D03D15/0094 , D10B2505/04
Abstract: The invention relates to a filter medium having a filter fabric on an upper side and a support fabric on a lower side, wherein the filter fabric and the support fabric have different yams and together take the form of a double weave, wherein the filter fabric has a pore count of 4000/cm2 or greater, preferably 5000/cm2.
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公开(公告)号:US09993759B2
公开(公告)日:2018-06-12
申请号:US14769631
申请日:2014-06-26
Applicant: Sefar AG
Inventor: Isabell Erlenmaier , Christian Dietmayer , Christian Gurtner , Christoph Maurer
CPC classification number: B01D39/083 , B01D35/02 , B01D39/086 , B01D2239/0654 , B01D2239/1216 , B01D2239/1291 , B24B55/12 , D03D1/00
Abstract: The invention relates to a filter device for treating a rinsing liquid for material-removing machining, said filter device having a filter element through which the rinsing liquid can be conducted for separating removed material particles. In order to increase the service life, the filter element is provided with a filter fabric, on the filtration upper side of which are formed fabric pores in the form of distinctive longitudinal slots which have a ratio of length to width of ≥4:1.
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