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1.发明授权Pushable frame with generators that convert kinetic energy into electric energy 有权具有将动能转换成电能的发电机的可推式框架公开(公告)号：US08881852B2
公开(公告)日：2014-11-11
申请号：US13380887
申请日：2010-09-20
Applicant: Seong-yoon Kim
Inventor： Seong-yoon Kim
CPC classification number: A61H3/04 , A61H2201/0188 , A61H2201/5079 , A61H2201/5097
Abstract: A pushable frame includes a plurality of wheels to allow maneuvering due to a rolling motion of one or more wheels. A power generator is operatively connected to the wheels such that kinetic motion of the wheels caused by the frame being pushed or pulled by the user is converted into electric energy. A speed regulator is operatively connected with the plurality of wheels and the power generator such that a rolling speed of one or more wheels is controlled based on a rolling condition of the one or more wheels.
Abstract translation: 可推动框架包括多个车轮，以允许由于一个或多个车轮的滚动运动而进行操纵。 发电机可操作地连接到车轮上，使由车轮引起的车轮的动力运动被用户推动或拉动转换成电能。 速度调节器与多个车轮和发电机可操作地连接，使得基于一个或多个车轮的滚动条件来控制一个或多个车轮的滚动速度。
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公开(公告)号：US07691548B2
公开(公告)日：2010-04-06
申请号：US12222987
申请日：2008-08-21
Applicant: Seong-yoon Kim
Inventor： Seong-yoon Kim
CPC classification number: G03F1/36 , Y10S430/143
Abstract: There is provided a method of manufacturing a photomask for forming a semiconductor pattern. The method may include forming a plurality of dies including a main pattern, and forming a pseudo pattern to an area adjacent to the main pattern between the plurality of dies. A multi developing process of sequentially and repeatedly supplying a developer on the mask, supplying DI water on the mask, and drying the mask may be performed in manufacturing the mask.
Abstract translation: 提供了一种制造用于形成半导体图案的光掩模的方法。 该方法可以包括形成包括主图案的多个模具，并且在多个模具之间的与主图案相邻的区域上形成伪图案。 可以在制造掩模时执行顺序地和重复地向掩模提供显影剂，在掩模上供应DI水并干燥掩模的多显影过程。
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公开(公告)号：US20090075186A1
公开(公告)日：2009-03-19
申请号：US12222987
申请日：2008-08-21
Applicant: Seong-yoon Kim
Inventor： Seong-yoon Kim
IPC: G03F1/00
CPC classification number: G03F1/36 , Y10S430/143
Abstract: There is provided a method of manufacturing a photomask for forming a semiconductor pattern. The method may include forming a plurality of dies including a main pattern, and forming a pseudo pattern to an area adjacent to the main pattern between the plurality of dies. A multi developing process of sequentially and repeatedly supplying a developer on the mask, supplying DI water on the mask, and drying the mask may be performed in manufacturing the mask.
Abstract translation: 提供了一种制造用于形成半导体图案的光掩模的方法。 该方法可以包括形成包括主图案的多个模具，并且在多个模具之间的与主图案相邻的区域上形成伪图案。 可以在制造掩模时执行顺序地和重复地向掩模提供显影剂，在掩模上供应DI水并干燥掩模的多显影过程。
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