公开(公告)号：US20170089813A1

公开(公告)日：2017-03-30

申请号：US15379049

申请日：2016-12-14

Applicant: TECHINSIGHTS INC.

Inventor： Robert K. Foster ,  Christopher Pawlowicz ,  Jason Abt ,  Ian Jones ,  Heinz Josef Nentwich

IPC: G01N1/32 ,  H01J37/32 ,  H01L23/00

Abstract: There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

公开(公告)号：US10689763B2

公开(公告)日：2020-06-23

申请号：US15379049

申请日：2016-12-14

Applicant: TECHINSIGHTS INC.

Inventor： Robert K. Foster ,  Christopher Pawlowicz ,  Jason Abt ,  Ian Jones ,  Heinz Josef Nentwich

IPC: C23F4/00 ,  G01N1/32 ,  H01L23/00 ,  H01J37/32 ,  H01L21/263 ,  H01L21/66

Abstract: There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

公开(公告)号：US10469777B2

公开(公告)日：2019-11-05

申请号：US15560935

申请日：2016-03-22

Applicant: TechInsights Inc.

Inventor： Christopher Pawlowicz ,  Alexander Sorkin ,  Vladimir Martincevic

IPC: H01J37/304 ,  H01J37/26 ,  H01J37/22 ,  H04N5/357 ,  G01N23/2251 ,  H01J37/28

Abstract: Devices, systems and methods relating to a distortion-correcting imaging for collecting image-related data of a substrate are disclosed, comprising: a beam emitter for directing an emission at an intended location on the substrate, and a signal detector for determining a signal intensity value associated with the emission; wherein the signal intensity value is associated with a corrected substrate location, said corrected substrate location determined from the intended substrate location and a correction factor, said correction factor being a function of said intended substrate location.

公开(公告)号：US20170096741A1

公开(公告)日：2017-04-06

申请号：US15378551

申请日：2016-12-14

Applicant: TECHINSIGHTS INC.

Inventor： Robert K. Foster ,  Christopher Pawlowicz ,  Jason Abt ,  Ian Jones ,  Heinz Josef Nentwich

IPC: C23F4/00 ,  H01J37/32 ,  G01N1/32 ,  H01L21/263 ,  H01L21/66

Abstract: There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

公开(公告)号：US12165840B2

公开(公告)日：2024-12-10

申请号：US17309372

申请日：2019-11-20

Applicant: TechInsights Inc.

Inventor： Christopher Pawlowicz ,  Alexander Sorkin

IPC: H01J37/304 ,  G01N1/28 ,  G01N1/32 ,  G01N23/2251 ,  G01R31/28 ,  H01J37/31

Abstract: Described are various embodiments of an ion beam delayering system and method, topographically enhanced sample produced thereby, and imaging methods and systems related thereto. In one embodiment, a method comprises: identifying at least two materials in an exposed surface of the sample and predetermined operational characteristics of an ion beam mill that correspond with a substantially different ion beam mill removal rate for at least one of the materials; operating the ion beam mill in accordance with the predetermined operational characteristics to simultaneously remove the materials and introduce or enhance a topography associated with the materials and surface features defined thereby; acquiring surface data; and repeating the operating and acquiring steps for at least one more layer.

公开(公告)号：US20230273256A1

公开(公告)日：2023-08-31

申请号：US18007716

申请日：2021-06-01

Applicant: Christopher Pawlowicz ,  Spyridon Ntais ,  TECHINSIGHTS INC.

Inventor： Christopher Pawlowicz ,  Spyridon Ntais

IPC: G01R31/28 ,  G01N23/2251 ,  H01L23/14

CPC classification number: G01R31/2898 ,  G01N23/2251 ,  H01L23/147 ,  G01N2223/6116

Abstract: Described are various embodiments of a contrast-enhancing staining system and method. In one embodiment, a method is described for enhancing contrast in an image of a substrate surface between regions of said substrate having different charge carrier characteristics. The method comprises exposing said substrate to a staining precursor comprising an oxidant; directing microwave electromagnetic radiation at the substrate, said microwave electromagnetic radiation enhancing a reaction rate of said oxidant reacting into a deposition material, said reaction rate being related to the charge carrier characteristics of a proximal region; and acquiring an image of said substrate surface indicating a visual contrast between each of said regions based on differential deposition of the deposition material therebetween.

公开(公告)号：US11214874B2

公开(公告)日：2022-01-04

申请号：US16906436

申请日：2020-06-19

Applicant: TECHINSIGHTS INC.

Inventor： Robert K. Foster ,  Christopher Pawlowicz ,  Jason Abt ,  Ian Jones ,  Heinz Josef Nentwich

IPC: G01N1/32 ,  C23F4/00 ,  H01L23/00 ,  H01J37/32 ,  H01L21/263 ,  H01L21/66

Abstract: There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

公开(公告)号：US09529040B2

公开(公告)日：2016-12-27

申请号：US14811549

申请日：2015-07-28

Applicant: TECHINSIGHTS INC.

Inventor： Christopher Pawlowicz ,  Alexander Sorkin ,  Alexander Krechmer

IPC: G21G5/00 ,  G01R31/303 ,  G01R31/28 ,  G01N23/225 ,  H01L21/66

CPC classification number: G01R31/303 ,  G01N23/2255 ,  G01R31/2896 ,  H01J2237/24564 ,  H01J2237/24585 ,  H01J2237/2803 ,  H01J2237/2809 ,  H01J2237/31749 ,  H01L22/12

Abstract: Described are various embodiments of methods and systems for tracing circuitry on integrated circuits using focused ion beam based imaging techniques. In one such embodiment, a method is provide for identifying functional componentry associated with a switchable power interface on an integrated circuit, wherein the switchable power interface comprises a source and a drain with a control switch therebetween, said control switch being controllable by a control signal during operation of the integrated circuit. The method comprises connecting, with deposited conductive material, the source and the drain; applying an external voltage bias to a power input of the switchable power interface via one of the source and the drain; exposing the integrated circuit to a focused ion beam; and gathering an image of the integrated circuit during exposure to determine areas of high contrast indicating functional componentry in operative connection with the switchable power interface.

Abstract translation: 描述了使用基于聚焦离子束的成像技术在集成电路上跟踪电路的方法和系统的各种实施例。 在一个这样的实施例中，提供了一种用于识别与集成电路上的可切换电力接口相关联的功能组件的方法，其中所述可切换电力接口包括其间具有控制开关的源极和漏极，所述控制开关由控制信号 在集成电路运行期间。 该方法包括用沉积的导电材料连接源极和漏极; 通过源极和漏极中的一个将外部电压施加到可切换电力接口的功率输入; 将集成电路暴露于聚焦离子束; 以及在曝光期间收集集成电路的图像，以确定与可切换电源接口可操作连接的功能组件的高对比度区域。

公开(公告)号：US20250104257A1

公开(公告)日：2025-03-27

申请号：US18730253

申请日：2023-01-23

Applicant: TECHINSIGHTS INC.

Inventor： Christopher Pawlowicz ,  Michael Green ,  Bruno Machado Trindade ,  Hamed Bagheri ,  Nabil David Bassim ,  Nasim Khoonkari ,  Christopher Kumar Anand

IPC: G06T7/32

Abstract: Described are various embodiments of image registration methods and systems, as well as associated non-transitory computer readable mediums comprising instructions directed to image registration.

公开(公告)号：US12176177B2

公开(公告)日：2024-12-24

申请号：US17805663

申请日：2022-06-06

Applicant: TECHINSIGHTS INC.

Inventor： Christopher Pawlowicz ,  Alexander Sorkin ,  Trevor Jason French ,  Ian Jones ,  Paul Gagnon

IPC: H01J37/08 ,  H01J37/32

Abstract: Described are various embodiments of an ion beam chamber fluid delivery system and method for delivering a fluid onto a substrate in an ion beam system during operation. In one embodiment, the system comprises: a chamber comprising an ion beam gun oriented so as to cause ions to impinge the substrate, said chamber having a fluid delivery conduit therein for delivering the fluid into the chamber; a transferable substrate stage for holding the substrate, the transferable stage further configured to move between an operating position and a payload position during non-operation, said payload position for receiving and removing said substrate; and a fluid delivery nozzle being in a fixed location relative to the transferable stage, at least during operation, with an outlet position that is configured to deliver a fluid to a predetermined location on said transferable stage.