公开(公告)号：US11214874B2

公开(公告)日：2022-01-04

申请号：US16906436

申请日：2020-06-19

Applicant: TECHINSIGHTS INC.

Inventor： Robert K. Foster ,  Christopher Pawlowicz ,  Jason Abt ,  Ian Jones ,  Heinz Josef Nentwich

IPC: G01N1/32 ,  C23F4/00 ,  H01L23/00 ,  H01J37/32 ,  H01L21/263 ,  H01L21/66

Abstract: There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

公开(公告)号：US20170089813A1

公开(公告)日：2017-03-30

申请号：US15379049

申请日：2016-12-14

Applicant: TECHINSIGHTS INC.

Inventor： Robert K. Foster ,  Christopher Pawlowicz ,  Jason Abt ,  Ian Jones ,  Heinz Josef Nentwich

IPC: G01N1/32 ,  H01J37/32 ,  H01L23/00

Abstract: There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

公开(公告)号：US10689763B2

公开(公告)日：2020-06-23

申请号：US15379049

申请日：2016-12-14

Applicant: TECHINSIGHTS INC.

Inventor： Robert K. Foster ,  Christopher Pawlowicz ,  Jason Abt ,  Ian Jones ,  Heinz Josef Nentwich

IPC: C23F4/00 ,  G01N1/32 ,  H01L23/00 ,  H01J37/32 ,  H01L21/263 ,  H01L21/66

Abstract: There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

公开(公告)号：US20170096741A1

公开(公告)日：2017-04-06

申请号：US15378551

申请日：2016-12-14

Applicant: TECHINSIGHTS INC.

Inventor： Robert K. Foster ,  Christopher Pawlowicz ,  Jason Abt ,  Ian Jones ,  Heinz Josef Nentwich

IPC: C23F4/00 ,  H01J37/32 ,  G01N1/32 ,  H01L21/263 ,  H01L21/66

Abstract: There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

公开(公告)号：US20200318242A1

公开(公告)日：2020-10-08

申请号：US16906436

申请日：2020-06-19

Applicant: TECHINSIGHTS INC.

Inventor： Robert K. Foster ,  Christopher Pawlowicz ,  Jason Abt ,  Ian Jones ,  Heinz Josef Nentwich

IPC: C23F4/00 ,  G01N1/32 ,  H01L23/00 ,  H01J37/32 ,  H01L21/263 ,  H01L21/66

Abstract: There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

公开(公告)号：US10550480B2

公开(公告)日：2020-02-04

申请号：US15378551

申请日：2016-12-14

Applicant: TECHINSIGHTS INC.

Inventor： Robert K. Foster ,  Christopher Pawlowicz ,  Jason Abt ,  Ian Jones ,  Heinz Josef Nentwich

IPC: C23F4/00 ,  G01N1/32 ,  H01L23/00 ,  H01J37/32 ,  H01L21/263 ,  H01L21/66

Abstract: There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.