公开(公告)号：US11512199B2

公开(公告)日：2022-11-29

申请号：US16338876

申请日：2017-10-31

Applicant: TORAY INDUSTRIES, INC.

Inventor： Yusuke Komori ,  Kazuto Miyoshi

IPC: C08L79/08 ,  C08G73/06 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40

Abstract: The present invention provides a resin composition which is highly sensitive and exhibits high chemical resistance even in the case of being baked at a low temperature of 250° C. or less and can suppress the generation of outgas after curing. The present invention is a resin composition which contains (a) an alkali-soluble resin containing polyimide, polybenzoxazole, polyamide-imide, a precursor of any one of these compounds and/or a copolymer of these compounds and (b) an alkali-soluble resin having a monovalent or divalent group represented by the following general formula (1) in a structural unit and in which the modification rate of a phenolic hydroxyl group in the alkali-soluble resin (b) is 5% to 50%. (In general formula (1), O represents an oxygen atom. R1 represents a hydrogen atom or a hydrocarbon group which has 1 to 20 carbon atoms and may be substituted and R2 represents an alkyl group having 1 to 5 carbon atoms. s and t each independently represent an integer from 0 to 3. Provided that (s+t)≥1. d represents an integer from 0 to 2. u represents an integer from 1 to 2, and * represents a chemical bond.)

公开(公告)号：US11360386B2

公开(公告)日：2022-06-14

申请号：US16465939

申请日：2017-12-15

Applicant: TORAY INDUSTRIES, INC.

Inventor： Akihiro Ishikawa ,  Kazuto Miyoshi

IPC: H01L51/00 ,  G03F7/037

Abstract: An organic EL display device having excellent light-emitting reliability while it has pixel division layer (8) and/or planarization layer (4) having excellent optical properties is provided.
An organic EL display device comprising first electrode (10), the pixel division layer (8), light emitting pixel (9), second electrode (5), the planarization layer (4), and substrate (6) wherein the pixel division layer (8) and/or the planarization layer (4) contains a yellow pigment having the benzimidazolone structure represented by the structural formula (1):

公开(公告)号：US11199776B2

公开(公告)日：2021-12-14

申请号：US16314822

申请日：2017-07-25

Applicant: TORAY INDUSTRIES, INC.

Inventor： Yusuke Komori ,  Kazuto Miyoshi

IPC: G03F7/023 ,  G03F7/038 ,  G03F7/40 ,  H01L23/29 ,  G03F7/20 ,  C07C233/80 ,  C08G73/10 ,  C07C233/44 ,  C08G73/22 ,  H05B33/10 ,  H01L27/32 ,  C08L101/02 ,  H01L51/50 ,  C08L79/08 ,  H05B33/22 ,  G03F7/004 ,  G03F7/022 ,  C08K5/20 ,  C07C233/43 ,  C07C237/40 ,  C08J5/18 ,  G03F7/039 ,  G03F7/16 ,  G03F7/30 ,  H01L21/78 ,  H01L23/544 ,  H01L23/00 ,  H01L27/12 ,  H01L51/00 ,  H01L51/56

Abstract: The present invention provides a resin composition having a high sensitivity and serving to produce a cured film with a low water absorption rate. The resin composition includes: (a) an alkali-soluble resin and (b1) an amido-phenol compound containing a phenolic hydroxyl group in which a monovalent group as represented by the undermentioned general formula (1) is located at the ortho position and/or (b2) an aromatic amido acid compound containing a carboxy group in which a monovalent group as represented by the undermentioned general formula (2) is located at the ortho position: wherein in general formula (1), X is a monovalent organic group having an alkyl group that contains 2 to 20 carbon atoms and bonds directly to the carbonyl carbon in general formula (1) or a monovalent organic group that has —(YO)n—; and in general formula (2), U is a monovalent organic group that has an alkyl group containing 2 to 20 carbon atoms and bonding directly to the amide nitrogen in general formula (2) or a monovalent organic group that has —(YO)n—; wherein Y is an alkylene group containing 1 to 10 carbon atoms and n is an integer of 1 to 20.

公开(公告)号：US09897915B2

公开(公告)日：2018-02-20

申请号：US14647747

申请日：2013-12-13

Applicant: TORAY INDUSTRIES, INC.

Inventor： Yusuke Komori ,  Mika Koshino ,  Kazuto Miyoshi

IPC: C09D7/12 ,  G03F7/038 ,  C09D179/08 ,  G03F7/037 ,  C08G73/10 ,  G03F7/004 ,  G03F7/023 ,  G03F7/40 ,  H01L27/32 ,  H01L51/52

CPC classification number: G03F7/0387 ,  C08G73/1039 ,  C09D7/40 ,  C09D179/08 ,  G03F7/0046 ,  G03F7/0233 ,  G03F7/037 ,  G03F7/40 ,  H01L27/3258 ,  H01L51/529

Abstract: The present invention provides a photosensitive resin composition which uses a polyimide precursor that has excellent solubility in organic solvents and is capable of reducing the viscosity of a resin composition obtained therefrom. The solution according to the present invention is a photosensitive resin composition which contains: an aromatic amide resin that has, as a main repeating unit, a specific structure having an amide group, a trifluoromethyl group and an aromatic ring; (b) a sensitizer; and (c) a solvent.

公开(公告)号：US11953830B2

公开(公告)日：2024-04-09

申请号：US17436941

申请日：2020-03-04

Applicant: TORAY INDUSTRIES, INC.

Inventor： Yusuke Komori ,  Takashi Sumi ,  Kazuto Miyoshi

IPC: G03F7/023 ,  G03F7/40 ,  H01L23/532 ,  H10K59/122 ,  H10K59/124

CPC classification number: G03F7/0233 ,  G03F7/40 ,  H01L23/5329 ,  H10K59/122 ,  H10K59/124

Abstract: The present invention addresses the problem of providing a photosensitive resin composition which exhibits good imidization rate even in cases where the photosensitive resin composition is fired at a temperature of 200° C. or less, while having high pattern processability, and a cured film of which exhibits high long-term reliability if used in an organic EL display device. In order to solve the above-described problem, a photosensitive resin composition according to the present invention contains (a) a polyimide precursor, (b) a phenolic compound having an electron-withdrawing group and (c) a photosensitive compound; and the polyimide precursor (a) has a residue which is derived from a diamine that has an ionization potential of less than 7.1 eV.

公开(公告)号：US10896942B2

公开(公告)日：2021-01-19

申请号：US15546153

申请日：2016-03-07

Applicant: TORAY INDUSTRIES, INC.

Inventor： Takeshi Arai ,  Satoshi Kamemoto ,  Kazuto Miyoshi

IPC: H01L51/00 ,  H01L27/32 ,  H01L51/50 ,  H05B33/10 ,  H05B33/22 ,  C08G73/10 ,  H05B33/12 ,  H01L51/52 ,  H01L51/56

Abstract: The purpose is to provide an organic EL display device which has good sensitivity and is free from the occurrence of luminance decrease or pixel shrinkage, thereby having excellent long-term reliability. In order to achieve the above-described purpose, provided is the following configuration. Namely, an organic EL display device wherein an insulating layer formed on a first electrode is a cured film obtained by curing a photosensitive resin composition; and the residual amount of acid anhydrides contained in the cured film is from 0.003 to 0.04 (inclusive) when the residual amount of aromatic rings contained in the cured film is taken as 1 (the reference value).

公开(公告)号：US11852973B2

公开(公告)日：2023-12-26

申请号：US17273401

申请日：2019-09-04

Applicant: TORAY Industries, Inc.

Inventor： Yusuke Komori ,  Kazuto Miyoshi

IPC: G03F7/023 ,  G03F7/022 ,  G03F7/40 ,  C08F2/48 ,  C08F4/26 ,  C08F12/24 ,  G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  H10K85/30 ,  H10K85/60 ,  H10K50/11

CPC classification number: G03F7/0236 ,  C08F2/48 ,  C08F4/26 ,  C08F12/24 ,  G03F7/0226 ,  G03F7/0233 ,  G03F7/0382 ,  G03F7/2004 ,  G03F7/327 ,  G03F7/38 ,  G03F7/40 ,  H10K85/342 ,  H10K85/626 ,  H10K85/631 ,  H10K85/654 ,  H10K50/11

Abstract: The present invention relates to a photosensitive resin composition having high sensitivity, high bending resistance for the cured film, and high long-term reliability for an organic EL display device in which the cured film is used. The present invention is a photosensitive resin composition containing an alkali-soluble resin (a), a phenolic resin (b) having a halogen atom, and a photosensitive compound (c).

公开(公告)号：US11561470B2

公开(公告)日：2023-01-24

申请号：US16495745

申请日：2018-03-27

Applicant: TORAY INDUSTRIES, INC.

Inventor： Yugo Tanigaki ,  Kazuto Miyoshi

IPC: G03F7/037 ,  G03F7/038 ,  G03F7/40 ,  G03F7/075 ,  H01L51/56 ,  G02F1/1339 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

Abstract: The invention aims to provide a cured film that is high in sensitivity, able to form a pattern having a small-tapered shape after a development step and after a heat curing step, helpful to depress the difference in the width of patterned openings between before and after the heat curing step, and high in light-shielding capability and also aims to provide a negative type photosensitive resin composition that serves for the production thereof. The negative type photosensitive resin composition includes an alkali-soluble resin (A), a radical polymerizable compound (B), a photo initiator (C1), and a black colorant (Da); the alkali-soluble resin (A) including a first resin (A1) containing one or more selected from the group consisting of polyimide (A1-1), polyimide precursor (A1-2), polybenzoxazole (A1-3), polybenzoxazole precursor (A1-4), and polysiloxane (A1-5); and the radical polymerizable compound (B) including one or more selected from the group consisting of a fluorene backbone-containing radical polymerizable compound (B1) and an indane backbone-containing radical polymerizable compound (B2).

公开(公告)号：US11156918B2

公开(公告)日：2021-10-26

申请号：US16491497

申请日：2018-03-15

Applicant: TORAY INDUSTRIES, INC.

Inventor： Akihiro Ishikawa ,  Kazuto Miyoshi

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/028 ,  H01L51/50

Abstract: A photosensitive composition containing at least one compound selected from the group of the following (a-1) to (a-3) and containing (b) a photosensitizer: (a-1) an epoxy compound having a C9-C19 long-chain alkyl group, (a-2) a resin having a structure represented by the following general formula (1), and (a-3) a resin having a structure represented by the following general formula (2). A photosensitive composition capable of forming a pixel division layer that has high flexibility and affords excellent light emission reliability to an organic EL display device is provided.

公开(公告)号：US10983436B2

公开(公告)日：2021-04-20

申请号：US16084866

申请日：2017-03-17

Applicant: TORAY INDUSTRIES, INC.

Inventor： Yugo Tanigaki ,  Satoshi Kamemoto ,  Kazuto Miyoshi

IPC: G03F7/32 ,  G03F7/038 ,  G03F7/075 ,  G03F7/037 ,  G02F1/1335 ,  G02F1/1339 ,  G02F1/1368 ,  G03F7/023 ,  G03F7/16 ,  G03F7/20 ,  G03F7/40 ,  H01L21/027 ,  H01L27/12 ,  H01L51/56 ,  H01L51/00 ,  H01L51/52 ,  H01L21/02 ,  H01L21/311 ,  G02F1/1362 ,  H01L27/32

Abstract: The present invention provides a negative type photosensitive resin composition having high sensitivity, excellent halftone characteristics, capability to form a small tapered pattern shape, and alkali-developability. The negative type photosensitive resin composition includes, as an alkali-soluble resin (A), at least a weakly acidic group-containing resin (A1) and an unsaturated group-containing resin (A2), the weakly acidic group-containing resin (A1) containing an acidic group having an acid dissociation constant in the range of 13.0 to 23.0 in dimethyl sulfoxide, and the unsaturated group-containing resin (A2) containing an ethylenically unsaturated double bond group.