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1.发明公开公开(公告)号：US20240254390A1
公开(公告)日：2024-08-01
申请号：US18628784
申请日：2024-04-07
Applicant: Tech Met, Inc.
Inventor： Michael Vidra , Edward Palanko , Robert Vaccaro , Jordan Incerpi
Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and optionally an amine, one or more chelating agents, and certain dissolved metals, such as component metals of the metal or alloy to be etched and optionally iron. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.
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公开(公告)号：US20220017822A1
公开(公告)日：2022-01-20
申请号：US17488093
申请日：2021-09-28
Applicant: TECH MET, INC.
Inventor： Michael Vidra , Edward Palanko , Robert Vaccaro , Jordan Incerpi
Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and optionally an amine, one or more chelating agents, and certain dissolved metals, such as component metals of the metal or alloy to be etched and optionally iron. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.
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公开(公告)号：US11932947B2
公开(公告)日：2024-03-19
申请号：US17005884
申请日：2020-08-28
Applicant: TECH MET, INC.
Inventor： Michael Vidra , Jordan Incerpi , Daniel Jon Schutzer
CPC classification number: C23F1/26 , A61F2/30767 , A61L31/022 , A61F2002/30925 , A61F2310/00029 , B82Y5/00 , B82Y30/00 , B82Y40/00
Abstract: Compositions and methods for etching an implantable device having a cobalt chrome surface are disclosed. The compositions generally include at least two mineral acids, iron (Fe), and certain component metals of the cobalt chrome to be etched. For example, when etching a cobalt chromium molybdenum alloy, the metals may include chromium (Cr), molybdenum (Mo), and optionally, cobalt (Co). The at least two mineral acids may include hydrochloric acid (HCl), nitric acid (HNO3), and hydrofluoric acid (HF). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with improved osseointegration, biocompatibility, and healing after surgery.
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公开(公告)号：US11682550B2
公开(公告)日：2023-06-20
申请号：US16787432
申请日：2020-02-11
Applicant: Tech Met, Inc.
Inventor： Michael Vidra , Robert Vaccaro , Edward Palanko , Mark Megela
IPC: H01S3/00 , H01L21/02 , G02B27/09 , H01S5/00 , G02B27/30 , B23K26/352 , B23K26/362 , B23K26/402 , B23H3/00 , B26D7/26 , B26D3/08 , C23F1/00 , C23F1/02 , C23F1/04 , B23K26/0622 , B23K26/10 , B23K26/40 , B23K26/08 , B23K26/046 , B23K26/00 , B23K26/361 , G02B26/10 , H01S5/062 , B23K103/16 , B23K101/12 , B23K103/00 , B23K103/08 , B23K101/06 , B23K103/02
CPC classification number: H01L21/02019 , B23H3/00 , B23K26/0006 , B23K26/046 , B23K26/0622 , B23K26/0823 , B23K26/0869 , B23K26/103 , B23K26/352 , B23K26/355 , B23K26/361 , B23K26/362 , B23K26/40 , B23K26/402 , B26D3/08 , B26D7/2614 , C23F1/00 , C23F1/02 , C23F1/04 , G02B26/10 , G02B27/0955 , G02B27/0977 , G02B27/30 , H01L21/02675 , H01S3/0071 , H01S5/0071 , H01S5/0085 , H01S5/06243 , B23K2101/06 , B23K2101/12 , B23K2103/02 , B23K2103/08 , B23K2103/16 , B23K2103/42 , B23K2103/50 , B23K2103/52 , B23K2103/54
Abstract: Systems and methods for etching complex patterns on an interior surface of a hollow object are disclosed. A method generally includes positioning a laser system within the hollow object with a focal point of the laser focused on the interior surface, and operating the laser system to form the complex pattern on the interior surface. Motion of the laser system and the hollow object is controlled by a motion control system configured to provide rotation and/or translation about a longitudinal axis of one or both of the hollow object and the laser system based on the complex pattern, and change a positional relationship between a reflector and a focusing lens of the laser system to accommodate a change in distance between the reflector and the interior surface of the hollow object.
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公开(公告)号：US20210062347A1
公开(公告)日：2021-03-04
申请号：US17005884
申请日：2020-08-28
Applicant: TECH MET, INC.
Inventor： Michael Vidra , Jordan Incerpi , Daniel Jon Schutzer
Abstract: Compositions and methods for etching an implantable device having a cobalt chrome surface are disclosed. The compositions generally include at least two mineral acids, iron (Fe), and certain component metals of the cobalt chrome to be etched. For example, when etching a cobalt chromium molybdenum alloy, the metals may include chromium (Cr), molybdenum (Mo), and optionally, cobalt (Co). The at least two mineral acids may include hydrochloric acid (HCl), nitric acid (HNO3), and hydrofluoric acid (HF). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with improved osseointegration, biocompatibility, and healing after surgery.
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Patent Agency Ranking
公开(公告)号：US20200176243A1
公开(公告)日：2020-06-04
申请号：US16787432
申请日：2020-02-11
Applicant: Tech Met, Inc.
Inventor： Michael Vidra , Robert Vaccaro , Edward Palanko , Mark Megela
IPC: H01L21/02 , B23K26/361 , B23K26/00 , B23K26/046 , B23K26/08 , B23K26/40 , B23K26/10 , B23K26/0622 , B23K26/352 , C23F1/04 , C23F1/02 , C23F1/00 , B26D3/08 , B26D7/26 , B23H3/00 , B23K26/402 , B23K26/362 , G02B27/09 , G02B27/30 , H01S5/00
Abstract: Systems and methods for etching complex patterns on an interior surface of a hollow object are disclosed. A method generally includes positioning a laser system within the hollow object with a focal point of the laser focused on the interior surface, and operating the laser system to form the complex pattern on the interior surface. Motion of the laser system and the hollow object is controlled by a motion control system configured to provide rotation and/or translation about a longitudinal axis of one or both of the hollow object and the laser system based on the complex pattern, and change a positional relationship between a reflector and a focusing lens of the laser system to accommodate a change in distance between the reflector and the interior surface of the hollow object.
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公开(公告)号：US11952669B2
公开(公告)日：2024-04-09
申请号：US17525203
申请日：2021-11-12
Applicant: TECH MET, INC.
Inventor： Michael Vidra , Daniel Jon Schutzer , Jordan Incerpi
CPC classification number: C23F1/28 , A61L27/042 , A61L27/047 , A61L27/06 , A61L27/365 , A61L27/50 , C23F1/30
Abstract: Compositions and methods for etching a nanoscale geometry on a metal or metal alloy surface are disclosed. Such surfaces, when included on an implantable medical device, enhance healing after surgery. When included on a bone contacting medical implant, the nanoscale geometry may enhance osseointegration. When included on a tissue contacting device, the nanoscale geometry may enhance endothelial cell attachment, proliferation, and restoration of a healthy endothelial surface.
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公开(公告)号：US11952523B2
公开(公告)日：2024-04-09
申请号：US17488093
申请日：2021-09-28
Applicant: TECH MET, INC.
Inventor： Michael Vidra , Edward Palanko , Robert Vaccaro , Jordan Incerpi
Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and optionally an amine, one or more chelating agents, and certain dissolved metals, such as component metals of the metal or alloy to be etched and optionally iron. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.
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公开(公告)号：US11851772B2
公开(公告)日：2023-12-26
申请号：US15930484
申请日：2020-05-13
Applicant: TECH MET, INC.
Inventor： Michael Vidra , Edward Palanko , Robert Vaccaro , Jordan Incerpi
CPC classification number: C23F1/40 , A61L27/06 , A61L27/365 , A61L31/022 , C09K13/02
Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and an amine, one or more chelating agents, and optionally iron (Fe) and/or certain component metals of the metal or alloy to be etched. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.
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10.发明申请公开(公告)号：US20220145474A1
公开(公告)日：2022-05-12
申请号：US17525203
申请日：2021-11-12
Applicant: TECH MET, INC.
Inventor： Michael Vidra , Daniel Jon Schutzer , Jordan Incerpi
Abstract: Compositions and methods for etching a nanoscale geometry on a metal or metal alloy surface are disclosed. Such surfaces, when included on an implantable medical device, enhance healing after surgery. When included on a bone contacting medical implant, the nanoscale geometry may enhance osseointegration. When included on a tissue contacting device, the nanoscale geometry may enhance endothelial cell attachment, proliferation, and restoration of a healthy endothelial surface.
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