公开(公告)号：US12271712B2

公开(公告)日：2025-04-08

申请号：US18457678

申请日：2023-08-29

Applicant: The MathWorks, Inc.

Inventor： Huanhuan Xu ,  Partha Biswas ,  Madhav Rajan ,  Sherman Braganza ,  Chirag Gupta ,  Neha Pal ,  Radhey Shyam Meena

IPC: G06F8/36 ,  G06F8/10 ,  G06F8/77

Abstract: Systems and methods for providing metric data for patterns in a modeling environment are disclosed. In some aspects, contexts for generating metric data for a pattern are constructed. The pattern represents one or more computations executable in the modeling environment and associated with operation or behavior of a real-world system. The contexts include information about the pattern. The metric data is associated with one or more objectives with which the use of the pattern is associated. Code for the pattern for each context is generated. Metric data is generated for the pattern and under each context. The metric data of the pattern under each context is associated with the objectives. The metric data and the association are stored for use in providing information about or based on the metric data when the pattern is to be or is used in a model representing the real-world system.

公开(公告)号：US11782682B2

公开(公告)日：2023-10-10

申请号：US17374806

申请日：2021-07-13

Applicant: The MathWorks, Inc.

Inventor： Huanhuan Xu ,  Partha Biswas ,  Madhav Rajan ,  Sherman Braganza ,  Chirag Gupta ,  Neha Pal ,  Radhey Shyam Meena

IPC: G06F9/44 ,  G06F8/36 ,  G06F8/77 ,  G06F8/10

CPC classification number: G06F8/36 ,  G06F8/10 ,  G06F8/77

Abstract: Systems and methods for providing metric data for patterns in a modeling environment are disclosed. In some aspects, contexts for generating metric data for a pattern are constructed. The pattern represents one or more computations executable in the modeling environment and associated with operation or behavior of a real-world system. The contexts include information about the pattern. The metric data is associated with one or more objectives with which the use of the pattern is associated. Code for the pattern for each context is generated. Metric data is generated for the pattern and under each context. The metric data of the pattern under each context is associated with the objectives. The metric data and the association are stored for use in providing information about or based on the metric data when the pattern is to be or is used in a model representing the real-world system.

公开(公告)号：US20230021771A1

公开(公告)日：2023-01-26

申请号：US17374806

申请日：2021-07-13

Applicant: The MathWorks, Inc.

Inventor： Huanhuan Xu ,  Partha Biswas ,  Madhav Rajan ,  Sherman Braganza ,  Chirag Gupta ,  Neha Pal ,  Radhey Shyam Meena

IPC: G06F8/36 ,  G06F8/10 ,  G06F8/77

Abstract: Systems and methods for providing metric data for patterns in a modeling environment are disclosed. In some aspects, contexts for generating metric data for a pattern are constructed. The pattern represents one or more computations executable in the modeling environment and associated with operation or behavior of a real-world system. The contexts include information about the pattern. The metric data is associated with one or more objectives with which the use of the pattern is associated. Code for the pattern for each context is generated. Metric data is generated for the pattern and under each context. The metric data of the pattern under each context is associated with the objectives. The metric data and the association are stored for use in providing information about or based on the metric data when the pattern is to be or is used in a model representing the real-world system.

公开(公告)号：US20230409296A1

公开(公告)日：2023-12-21

申请号：US18457678

申请日：2023-08-29

Applicant: The MathWorks, Inc.

Inventor： Huanhuan Xu ,  Partha Biswas ,  Madhav Rajan ,  Sherman Braganza ,  Chirag Gupta ,  Neha Pal ,  Radhey Shyam Meena

IPC: G06F8/36 ,  G06F8/77 ,  G06F8/10

CPC classification number: G06F8/36 ,  G06F8/77 ,  G06F8/10

Abstract: Systems and methods for providing metric data for patterns in a modeling environment are disclosed. In some aspects, contexts for generating metric data for a pattern are constructed. The pattern represents one or more computations executable in the modeling environment and associated with operation or behavior of a real-world system. The contexts include information about the pattern. The metric data is associated with one or more objectives with which the use of the pattern is associated. Code for the pattern for each context is generated. Metric data is generated for the pattern and under each context. The metric data of the pattern under each context is associated with the objectives. The metric data and the association are stored for use in providing information about or based on the metric data when the pattern is to be or is used in a model representing the real-world system.