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公开(公告)号:US10070536B2
公开(公告)日:2018-09-04
申请号:US15201622
申请日:2016-07-05
Applicant: Unimicron Technology Corp.
Inventor: Chien-Tsai Li , Chien-Te Wu , Cheng-Chung Lo
Abstract: Provided is a manufacturing method of a circuit board structure including steps as below. A glass film is provided on an electrostatic chuck (E-chuck). A dicing process is performed, such that at least one slit is formed in the glass film. A plurality of first conductive vias are formed in the glass film. A first circuit layer is formed on the glass film. A polymer layer is formed on the first circuit layer. The polymer layer covers surfaces of the first circuit layer and the glass film. A plurality of second conductive vias are formed in the polymer layer. A second circuit layer is formed on the polymer layer, such that a first circuit board structure is formed. A singulation process is performed, such that the first circuit board structure is divided into a plurality of second circuit board structures.
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公开(公告)号:US09917046B2
公开(公告)日:2018-03-13
申请号:US15201602
申请日:2016-07-04
Applicant: Unimicron Technology Corp.
Inventor: Chien-Te Wu , Chien-Tsai Li , Cheng-Chung Lo
IPC: H01K3/10 , H01L23/498 , H01L21/683 , H05K1/03 , H05K3/00 , H05K1/11 , H05K3/12 , H05K3/40 , H01L21/48
CPC classification number: H01L23/49838 , H01L21/4853 , H01L21/4857 , H01L21/486 , H01L21/6833 , H01L23/49822 , H01L23/49827 , H05K1/0306 , H05K1/115 , H05K3/002 , H05K3/0023 , H05K3/0029 , H05K3/1275 , H05K3/4007 , H05K3/4038 , Y10T29/49165
Abstract: Provided is a manufacturing method of a circuit board structure including steps as below. A glass film is provided on an electrostatic chuck (E-chuck). A plurality of first conductive vias are formed in the glass film. A first circuit layer is formed on an upper surface of the glass film, such that the first circuit layer is electrically connected with the first conductive vias. A first polymer layer is formed on the first circuit layer. The first polymer layer covers a surface of the first circuit layer and the upper surface of the glass film. A plurality of second conductive vias are formed in the first polymer layer. A second circuit layer is formed on the first polymer layer, such that the second circuit layer is electrically connected with the second conductive vias. The E-chuck is removed.
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公开(公告)号:US20180005933A1
公开(公告)日:2018-01-04
申请号:US15201602
申请日:2016-07-04
Applicant: Unimicron Technology Corp.
Inventor: Chien-Te Wu , Chien-Tsai Li , Cheng-Chung Lo
IPC: H01L23/498 , H05K3/12 , H05K1/11 , H01L21/48 , H05K1/03 , H01L21/683 , H05K3/40 , H05K3/00
CPC classification number: H01L23/49838 , H01L21/4853 , H01L21/4857 , H01L21/486 , H01L21/6833 , H01L23/49822 , H01L23/49827 , H05K1/0306 , H05K1/115 , H05K3/002 , H05K3/0023 , H05K3/0029 , H05K3/1275 , H05K3/4007 , H05K3/4038 , Y10T29/49165
Abstract: Provided is a manufacturing method of a circuit board structure including steps as below. A glass film is provided on an electrostatic chuck (E-chuck). A plurality of first conductive vias are formed in the glass film. A first circuit layer is formed on an upper surface of the glass film, such that the first circuit layer is electrically connected with the first conductive vias. A first polymer layer is formed on the first circuit layer. The first polymer layer covers a surface of the first circuit layer and the upper surface of the glass film. A plurality of second conductive vias are formed in the first polymer layer. A second circuit layer is formed on the first polymer layer, such that the second circuit layer is electrically connected with the second conductive vias. The E-chuck is removed.
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公开(公告)号:US20180014409A1
公开(公告)日:2018-01-11
申请号:US15201622
申请日:2016-07-05
Applicant: Unimicron Technology Corp.
Inventor: Chien-Tsai Li , Chien-Te Wu , Cheng-Chung Lo
IPC: H05K3/40 , H01L21/683 , H05K3/22 , H05K3/46
CPC classification number: H05K3/4038 , H05K3/22 , H05K3/4644
Abstract: Provided is a manufacturing method of a circuit board structure including steps as below. A glass film is provided on an electrostatic chuck (E-chuck). A dicing process is performed, such that at least one slit is formed in the glass film. A plurality of first conductive vias are formed in the glass film. A first circuit layer is formed on the glass film. A polymer layer is formed on the first circuit layer. The polymer layer covers surfaces of the first circuit layer and the glass film. A plurality of second conductive vias are formed in the polymer layer. A second circuit layer is formed on the polymer layer, such that a first circuit board structure is formed. A singulation process is performed, such that the first circuit board structure is divided into a plurality of second circuit board structures.
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