Plasmonic diamond films and related methods

    公开(公告)号:US11236426B2

    公开(公告)日:2022-02-01

    申请号:US16104460

    申请日:2018-08-17

    Abstract: Methods of forming plasmonic diamond films are provided. In an embodiment, such a method comprises forming a first layer of diamond on a substrate; depositing a layer of a metal on a surface of the first layer of diamond to form an as-deposited layer of metal; exposing the as-deposited layer of metal to a plasma treatment to convert the as-deposited layer of metal to a plurality of discrete regions of the metal on the surface of the first layer of diamond; and forming a second layer of diamond on the plurality of discrete regions of metal to form the plasmonic diamond film comprising a plurality of plasmonic nanoparticles.

    PLASMONIC DIAMOND FILMS AND RELATED METHODS
    3.
    发明申请

    公开(公告)号:US20190071779A1

    公开(公告)日:2019-03-07

    申请号:US16104460

    申请日:2018-08-17

    Abstract: Methods of forming plasmonic diamond films are provided. In an embodiment, such a method comprises forming a first layer of diamond on a substrate; depositing a layer of a metal on a surface of the first layer of diamond to form an as-deposited layer of metal; exposing the as-deposited layer of metal to a plasma treatment to convert the as-deposited layer of metal to a plurality of discrete regions of the metal on the surface of the first layer of diamond; and forming a second layer of diamond on the plurality of discrete regions of metal to form the plasmonic diamond film comprising a plurality of plasmonic nanoparticles.

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