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    Method of forming a structure upon a substrate
    3.
    发明授权
    Method of forming a structure upon a substrate 有权

    公开(公告)号：US11490526B2

    公开(公告)日：2022-11-01

    申请号：US17265382

    申请日：2019-08-01

    Applicant: XTPL S.A.

    Inventor： Piotr Kowalczewski ,  Aneta Wiatrowska ,  Michal Dusza ,  Filip Granek

    IPC: H05K3/00 ,  H05K3/12 ,  H05K3/10 ,  H05K1/09

    Abstract: A method of forming a structure upon a substrate is disclosed. The method comprises: providing a substrate upon a surface of which a plurality of electrically conductive pads are disposed; depositing fluid containing a dispersion of electrically polarizable nanoparticles onto the substrate such that at least a portion of a first one of the plurality of pads is in contact with the fluid; applying an alternating electric field to the fluid using a first electrode and a second electrode, the first electrode being positioned so as to provide an effective first electrode end position from which the electric field is applied, coincident with the deposited fluid, and spaced apart from the first pad by a distance, and the second electrode being in contact with the first pad, such that a plurality of the nanoparticles are assembled to form a first elongate structure extending along at least part of the distance between the effective first electrode end position and the portion of the first pad.

    Method of estimating a line width of a nanoparticle line formed using a capillary tube, and related methods
    4.
    发明授权
    Method of estimating a line width of a nanoparticle line formed using a capillary tube, and related methods 有权

    公开(公告)号：US11754483B2

    公开(公告)日：2023-09-12

    申请号：US17337070

    申请日：2021-06-02

    Applicant: XTPL S.A.

    Inventor： Szymon Zieba ,  Maciej Tybel ,  Piotr Kowalczewski ,  Filip Granek

    IPC: G01N13/02

    CPC classification number: G01N13/02

    Abstract: A method of obtaining a numerical model is disclosed. The numerical model correlates estimated line width values to minimum pressure for gas bubble generation (MPGBG) values. An MPGBG value of each capillary tube in the reference group is measured for a liquid. A nanoparticle composition is deposited, under standard conditions, on substrate(s) from each respective reference capillary tube, to form nanoparticle lines. A line width of each of the nanoparticle lines deposited using each respective reference capillary tube is measured by a microscope apparatus. A numerical model that correlates estimated line width values to MPGBG values for the liquid is calculated.

    Method of printing fluid
    5.
    发明授权
    Method of printing fluid 有权

    公开(公告)号：US11673406B2

    公开(公告)日：2023-06-13

    申请号：US17425638

    申请日：2019-03-20

    Applicant: XTPL S.A.

    Inventor： Filip Granek ,  Aneta Wiatrowska ,  Krzysztof Fijak ,  Michal Dusza ,  Przemyslaw Cichon ,  Piotr Kowalczewski

    IPC: B41J2/175

    CPC classification number: B41J2/17596

    Abstract: Method of printing fluid on a printable surface of a substrate. A print head ejects fluid in a continuous stream. The print head that includes a micro-structural fluid ejector, which consists of output, elongate input, and tapering portions between the output and the elongate input portions. The output consists of an exit orifice of an inner diameter ranging between 0.1 μm and 5 μm and an end face having a surface roughness of less than 0.1 μm. The print head is positioned above the substrate with the output of the micro-structural fluid ejector pointing downward. During printing, the print head positioning system maintains a vertical distance between the end face and the printable surface of the substrate within a range of 0 μm to 5 μm, and the pneumatic system applies pressure to the fluid in the micro-structural fluid ejector in the range of −50,000 Pa to 1,000,000 Pa.

    METHOD OF FORMING AN ELECTRICALLY CONDUCTIVE FEATURE TRAVERSING A MICROSCOPIC STEP AND RELATED APPARATUS
    6.
    发明申请
    METHOD OF FORMING AN ELECTRICALLY CONDUCTIVE FEATURE TRAVERSING A MICROSCOPIC STEP AND RELATED APPARATUS 有权

    公开(公告)号：US20220310397A1

    公开(公告)日：2022-09-29

    申请号：US17654088

    申请日：2022-03-09

    Applicant: XTPL S.A.

    Inventor： Lukasz Witczak ,  Jolanta Gadzalinska ,  Aneta Wiatrowska ,  Karolina Fiaczyk ,  Piotr Kowalczewski ,  Filip Granek

    IPC: H01L21/288 ,  B82Y40/00 ,  B41M1/22 ,  H01B1/02

    Abstract: A method of forming an electrically conductive feature traversing a microscopic step on or in a substrate is disclosed. A metallic nanoparticle composition is continuously extruded from a capillary tube (nozzle) while displacing the capillary tube along a first portion of a trajectory from a first position (above a step-top portion) past an edge of the microscopic step to a second position to form a first extrudate. The composition is continuously extruded while displacing the nozzle along a sloped second portion of the trajectory from the second position to a third position (above a step-bottom portion) to form a second extrudate. The third position is at a lower height than the second position. The composition is continuously extruded while displacing the nozzle along a third portion of the trajectory from the third position to a fourth position (above the step-bottom portion). The feature includes the first, second, and third extrudates.

    Method of measuring a minimum pressure for gas bubble generation of a capillary tube, and related methods
    7.
    发明授权
    Method of measuring a minimum pressure for gas bubble generation of a capillary tube, and related methods 有权

    公开(公告)号：US12253537B2

    公开(公告)日：2025-03-18

    申请号：US17174892

    申请日：2021-02-12

    Applicant: XTPL S.A.

    Inventor： Szymon Zięba ,  Maciej Tybel ,  Piotr Kowalczewski ,  Filip Granek

    IPC: G01N7/14 ,  B01F23/231 ,  B01L3/00 ,  G01N13/02

    Abstract: A method of measuring a minimum pressure for gas bubble generation (MPGBG) value of a capillary tube is disclosed. The capillary tube has an inlet and an output portion including an outlet. The inlet is connected to a regulated pneumatic system, configured to supply a gas to the inlet under pressure. The output portion is immersed in a liquid. The gas is supplied to the inlet under a range of pressures including a higher pressure range and a lower pressure range. In the higher pressure range, gas bubbles are generated in the liquid from the outlet. In the lower pressure range, no gas bubbles are generated in the liquid from the outlet. A value of the minimum pressure for gas bubble generation (MPGBG) for the liquid is determined.
    Other methods include a method of measuring and storing MPGBG values of capillary tubes, methods of selecting at least one capillary tube from a plurality of capillary tubes, and a method of cutting a capillary tube to a desired MPGBG value.

    Fluid printing apparatus
    9.
    发明授权
    Fluid printing apparatus 有权

    公开(公告)号：US11673409B2

    公开(公告)日：2023-06-13

    申请号：US17425610

    申请日：2019-03-20

    Applicant: XTPL S.A.

    Inventor： Filip Granek ,  Aneta Wiatrowska ,  Krzysztof Fijak ,  Michal Dusza ,  Przemyslaw Cichon ,  Piotr Kowalczewski

    IPC: B41J3/28 ,  B41J2/045 ,  B41J2/175

    CPC classification number: B41J3/28 ,  B41J2/04505 ,  B41J2/17596

    Abstract: Fluid printing apparatus including substrate, print head, pneumatic system, and print head positioning system. The print head ejects fluid in a continuous stream with a micro-structural fluid ejector consisting of output, elongate input, and tapering portions between the output and elongate input portions. The output portion consists of an exit orifice of an inner diameter ranging between 0.1 μm and 5 μm and an end face having a surface roughness of less than 0.1 μm. The print head is positioned above the substrate with the output portion of the micro-structural fluid ejector pointing downward. During printing, the print head positioning system maintains a vertical distance between the end face and the printable surface of the substrate within a range of 0 μm to 5 μm, and the pneumatic system applies pressure to the fluid in the micro-structural fluid ejector in the range of −50,000 Pa to 1,000,000 Pa.

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