公开(公告)号：US10731268B2

公开(公告)日：2020-08-04

申请号：US16087462

申请日：2017-03-21

Applicant: XTPL S.A.

Inventor： Filip Granek ,  Zbigniew Rozynek

IPC: C25D13/12 ,  C25D13/22 ,  B82B3/00 ,  H01L29/06 ,  H01L21/02 ,  H01L21/326 ,  H01L21/67 ,  H01L21/66 ,  H05K3/12 ,  G02C7/04

Abstract: A method is provided for forming structures upon a substrate. The method comprises: depositing fluid onto a substrate so as to define a wetted region, the fluid containing electrically polahzable nanoparticles; applying an alternating electric field to the fluid on the region, using a first electrode and a second electrode, so that a plurality of the nanoparticles are assembled to form an elongate structure extending from the first electrode towards the second electrode; and removing the fluid such that the elongate structure remains upon the substrate.

公开(公告)号：US20190106804A1

公开(公告)日：2019-04-11

申请号：US16087462

申请日：2017-03-21

Applicant: XTPL S.A.

Inventor： Filip Granek ,  Zbigniew Rozynek

IPC: C25D13/12 ,  H01L21/02 ,  H01L21/66 ,  H01L21/326 ,  H01L21/67 ,  H05K3/12 ,  C25D13/22

Abstract: A method is provided for forming structures upon a substrate. The method comprises: depositing fluid onto a substrate so as to define a wetted region, the fluid containing electrically polahzable nanoparticles; applying an alternating electric field to the fluid on the region, using a first electrode and a second electrode, so that a plurality of the nanoparticles are assembled to form an elongate structure extending from the first electrode towards the second electrode; and removing the fluid such that the elongate structure remains upon the substrate.