Bridgeless power factor correction circuits

    公开(公告)号:US10063138B1

    公开(公告)日:2018-08-28

    申请号:US15428726

    申请日:2017-02-09

    Abstract: A power factor correction circuit comprises a pair of III-N based switches coupled to a first reference ground, and an inductive component connected in series with a current sensing resistor. A first side of the current sensing resistor is coupled to a second reference ground which is electrically isolated from the first reference ground, and a second side of the current sensing resistor is coupled to a control circuit. The control circuit is also coupled to the second reference ground and is configured to measure current flowing through the inductive component during operation of the power factor correction circuit.

    III-Nitride transistor including a III-N depleting layer

    公开(公告)号:US10043896B2

    公开(公告)日:2018-08-07

    申请号:US15836157

    申请日:2017-12-08

    Abstract: A transistor includes a III-N layer structure including a III-N channel layer between a III-N barrier layer and a III-N depleting layer, where the III-N channel layer includes a 2DEG channel formed adjacent an interface between the III-N channel layer and the III-N barrier layer; a source and a drain, each of which being directly connected to the III-N channel layer; a gate between the source and the drain, the gate being over the III-N layer structure, where the III-N depleting layer includes a first portion that is disposed in a device access region between the gate and the drain; and where the source electrically contacts the first portion of the III-N depleting layer, and the drain is electrically isolated from the first portion of the III-N depleting layer.

    Bridgeless power factor correction circuits
    4.
    发明授权
    Bridgeless power factor correction circuits 有权
    无桥功率因数校正电路

    公开(公告)号:US09590494B1

    公开(公告)日:2017-03-07

    申请号:US14802333

    申请日:2015-07-17

    Abstract: A power factor correction circuit comprises a pair of III-N based switches coupled to a first reference ground, and an inductive component connected in series with a current sensing resistor. A first side of the current sensing resistor is coupled to a second reference ground which is electrically isolated from the first reference ground, and a second side of the current sensing resistor is coupled to a control circuit. The control circuit is also coupled to the second reference ground and is configured to measure current flowing through the inductive component during operation of the power factor correction circuit.

    Abstract translation: 功率因数校正电路包括耦合到第一参考地的一对基于III-N的开关和与电流感测电阻器串联连接的电感元件。 电流感测电阻器的第一侧耦合到与第一参考地电隔离的第二参考地,并且电流感测电阻器的第二侧耦合到控制电路。 控制电路还耦合到第二参考地,并且被配置为在功率因数校正电路的操作期间测量流过电感元件的电流。

    III-nitride transistor including a p-type depleting layer
    5.
    发明授权
    III-nitride transistor including a p-type depleting layer 有权
    III族氮化物晶体管包括p型耗尽层

    公开(公告)号:US09443938B2

    公开(公告)日:2016-09-13

    申请号:US14327371

    申请日:2014-07-09

    Abstract: A transistor includes a III-N layer structure comprising a III-N channel layer between a III-N barrier layer and a p-type III-N layer. The transistor further includes a source, a drain, and a gate between the source and the drain, the gate being over the III-N layer structure. The p-type III-N layer includes a first portion that is at least partially in a device access region between the gate and the drain, and the first portion of the p-type III-N layer is electrically connected to the source and electrically isolated from the drain. When the transistor is biased in the off state, the p-type layer can cause channel charge in the device access region to deplete as the drain voltage increases, thereby leading to higher breakdown voltages.

    Abstract translation: 晶体管包括III-N层结构,其包含在III-N势垒层和p型III-N层之间的III-N沟道层。 晶体管还包括源极和漏极之间的源极,漏极和栅极,栅极在III-N层结构之上。 p型III-N层包括至少部分地在栅极和漏极之间的器件访问区域中的第一部分,并且p型III-N层的第一部分电连接到源极和电 从排水沟隔离。 当晶体管偏置为截止状态时,p型层可能导致器件访问区域中的沟道电荷随漏极电压增加而消耗,从而导致更高的击穿电压。

    High voltage III-nitride semiconductor devices
    7.
    发明授权
    High voltage III-nitride semiconductor devices 有权
    高电压III族氮化物半导体器件

    公开(公告)号:US09293561B2

    公开(公告)日:2016-03-22

    申请号:US14262649

    申请日:2014-04-25

    Abstract: A III-N device is described has a buffer layer, a first III-N material layer on the buffer layer, a second III-N material layer on the first III-N material layer on an opposite side from the buffer layer and a dispersion blocking layer between the buffer layer and the channel layer. The first III-N material layer is a channel layer and a compositional difference between the first III-N material layer and the second III-N material layer induces a 2DEG channel in the first III-N material layer. A sheet or a distribution of negative charge at an interface of the channel layer and the dispersion blocking layer confines electrons away from the buffer layer.

    Abstract translation: 描述了III-N器件具有缓冲层,缓冲层上的第一III-N材料层,与缓冲层相反侧的第一III-N材料层上的第二III-N材料层和分散体 缓冲层和通道层之间的阻挡层。 第一III-N材料层是沟道层,并且第一III-N材料层和第二III-N材料层之间的组成差异在第一III-N材料层中诱导2DEG沟道。 在沟道层和分散阻挡层的界面处的负电荷的片材或分布限制电子远离缓冲层。

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