公开(公告)号：US12125664B2

公开(公告)日：2024-10-22

申请号：US17575429

申请日：2022-01-13

Applicant: Oxford Instruments Nanotechnology Tools Limited

Inventor： David Pearson ,  Sebastien Pochon ,  Joao Ferreira

IPC: H01J37/08 ,  H01J27/02 ,  H01J37/32

CPC classification number: H01J37/08 ,  H01J27/024 ,  H01J37/32422 ,  H01J2237/083 ,  H01J2237/334

Abstract: A charged particle beam source for a surface processing apparatus is disclosed. The charged particle beam source comprises: a plasma chamber; a plasma generation unit adapted to convert an input gas within the plasma chamber into a plasma containing charged particles; and a grid assembly adjacent an opening of the plasma chamber. The grid assembly comprises one or more grids each having a plurality of apertures therethrough, the one or more grids being electrically biased in use so as to accelerate charged particles from the plasma through the grid(s) to thereby output a charged particle beam, the major axis of which is substantially perpendicular to the plane of the grid assembly. The transmissivity of the or each grid to the charged particles is defined by the relative proportion of aperture area to non-aperture area, and at least one of the grids has a transmissivity which varies across the grid along a first direction, the transmissivity being lower adjacent a first extremity of the grid than adjacent a second extremity of the grid opposite the first extremity, the first direction lying parallel to the plane of the grid assembly, such that in use the charged particle beam output by the source has a non-uniform charged particle current density profile in a plane parallel to the plane of the grid assembly which varies along the first direction, the charged particle current density being lower adjacent a first edge of the beam than adjacent a second edge of the beam opposite the first edge.

公开(公告)号：US20240282543A1

公开(公告)日：2024-08-22

申请号：US18651012

申请日：2024-04-30

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Po-Tang Tseng ,  Ching-Heng Yen ,  Tai-Kun Kao ,  Sheng-Tai Peng

IPC: H01J27/08 ,  H01J27/02 ,  H01J37/317 ,  H01L21/26

CPC classification number: H01J27/08 ,  H01J27/022 ,  H01J37/3171 ,  H01L21/26 ,  H01J2237/31701

Abstract: An assembly present in an ion source for supporting an arc chamber upon a base plate includes a first arc support plate, a first screw, and a second screw. The first screw passes through a smooth through-hole in an arm of the first arc support plate and extends into a bore in the base plate. The second (or adjustable) screw passes through a threaded through-hole in an arm of the first arc support plate and engages an upper surface of the base plate itself, and can be used to change the altitude and angle of the first arc support plate relative to the base plate. This adjustment ability improves the beam quality of the ion source.

公开(公告)号：US11923184B2

公开(公告)日：2024-03-05

申请号：US17644073

申请日：2021-12-13

Applicant: Plasmion GmbH

Inventor： Jan-Christoph Wolf

IPC: H01J49/10 ,  H01J27/02 ,  H01J37/08 ,  H01J37/32 ,  H01J49/00

CPC classification number: H01J49/105 ,  H01J27/02 ,  H01J37/08 ,  H01J37/32348 ,  H01J49/0031

Abstract: The present invention discloses an ionization apparatus 10 for ionizing an analyte S, comprising an inlet E, an outlet A, a first electrode 1, a second electrode 2 and a dielectric element 3. The first electrode 1, the second electrode 2 and the dielectric element 3 are arranged relative to one another such that, by applying an electric voltage between the first electrode 1 and the second electrode 2, a dielectric barrier discharge is establishable in a discharge area 5 in the ionization apparatus 10. The first and second electrodes 1, 2 are arranged such that they are displaceable or movable relative to each other.

公开(公告)号：US20230369003A1

公开(公告)日：2023-11-16

申请号：US18124740

申请日：2023-03-22

Applicant: ENPULSION GmbH

Inventor： Ivanhoe VASILJEVICH

IPC: H01J27/02 ,  B64G1/40

CPC classification number: H01J27/024 ,  B64G1/405

Abstract: A liquid metal ion source, in particular an ion thruster for propulsion of a spacecraft, comprises a reservoir for the liquid metal, an emitter penetrating a front wall of the reservoir for drawing liquid metal from the reservoir and emitting ions of the liquid metal, and an extractor supported with respect to the reservoir and facing the emitter for extracting and accelerating the ions from the emitter, wherein the reservoir is provided with advancing means for creating an electromagnetic field within the liquid metal in the reservoir to exert a force on the liquid metal in a direction towards the emitter.

公开(公告)号：US11501943B2

公开(公告)日：2022-11-15

申请号：US17253738

申请日：2019-07-09

Applicant: HIL Applied Medical, Ltd.

Inventor： Indranuj Dey ,  Evgeny Papeer ,  Alexander Bespaly ,  Shai Tsipshtein ,  Ynon Hefets ,  Assaf Shaham

IPC: H01J27/24 ,  G21K5/10 ,  H01J3/16 ,  H01J27/02

Abstract: Disclosed are systems and methods for generating a beam of charged particles, such as an ion beam. Such a system may comprise an interaction chamber configured to support a target, one or more electromagnetic radiation sources, a sensor, and at least one processor. The one or more electromagnetic radiation sources may be configured to provide a probe beam at a first energy for determining orientation data of the target and a particle-generating beam at a second energy, which is greater than the first energy, for producing a beam of charged particles. The processor may be configured to receive feedback information from the sensor and to cause a change in a relative orientation between the particle-generating beam and the target.

公开(公告)号：US11355314B2

公开(公告)日：2022-06-07

申请号：US17123883

申请日：2020-12-16

Applicant: CANON ANELVA CORPORATION

Inventor： Yasushi Yasumatsu ,  Naoyuki Okamoto ,  Masashi Tsujiyama ,  Fumihito Suzuki

IPC: H01J37/30 ,  H01J37/305 ,  H01J27/02 ,  H01J37/08 ,  B08B3/08 ,  H01J37/063 ,  H01J37/317

Abstract: Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

公开(公告)号：US11355303B2

公开(公告)日：2022-06-07

申请号：US17006049

申请日：2020-08-28

Applicant: TAE TECHNOLOGIES, INC.

Inventor： Christopher J. Killer ,  Vladislav Vekselman ,  Joshua Leuenberger

IPC: H01J37/12 ,  A61N5/10 ,  H01J49/06 ,  H01J27/02

Abstract: Embodiments of systems, devices, and methods relate to an electrode standoff isolator. An example electrode standoff isolator includes a plurality of adjacent insulative segments positioned between a proximal end and a distal end of the electrode standoff isolator. A geometry of the adjacent insulative is configured to guard a surface area of the electrode standoff isolator against deposition of a conductive layer of gaseous phase materials from a filament of an ion source.

公开(公告)号：US20210351003A1

公开(公告)日：2021-11-11

申请号：US17314928

申请日：2021-05-07

Applicant: Battelle Memorial Institute

Inventor： Sandilya V.B. Garimella ,  Yehia M. Ibrahim ,  Ailin Li ,  Richard D. Smith

IPC: H01J37/317 ,  H01J27/02 ,  H01J37/30

Abstract: Methods include directing a group of ions through a separation region of an ion manipulation apparatus, separating the group of ions in the separation region based on ion mobility, selecting a subset of the group of ions based on a dependence between ion mobility and ion arrival time of the separated ions at a deposition switch of the ion manipulation apparatus, and depositing the selected subset of ions on a substrate. Related systems and ion manipulation apparatus are disclosed. Also disclosed are methods and system that provide concurrent ion accumulation and ion separation in coupled and switchable electrode regions using traveling wave electric fields.

公开(公告)号：US20210074503A1

公开(公告)日：2021-03-11

申请号：US17078262

申请日：2020-10-23

Applicant: Applied Materials, Inc.

Inventor： Adam M. McLaughlin ,  Craig R. Chaney ,  Jordan B. Tye

IPC: H01J27/02

Abstract: An ion source having a thermally isolated repeller is disclosed. The repeller comprises a repeller disk and a plurality of spokes originating at the back surface of the repeller disk and terminating in a post. In certain embodiments, the post may be hollow through at least a portion of its length. The use of spokes rather than a central stem may reduce the thermal conduction from the repeller disk to the post. By incorporating a hollow post, the thermal conduction is further reduced. This configuration may increase the temperature of the repeller disk by more than 100° C. In certain embodiments, radiation shields are provided on the back surface of the repeller disk to reduce the amount of radiation emitted from the sides of the repeller disk. This may also help increase the temperature of the repeller. A similar design may be utilized for other electrodes in the ion source.

公开(公告)号：US20210071650A1

公开(公告)日：2021-03-11

申请号：US16771737

申请日：2017-12-12

Applicant: Rafael Advanced Defense Systems LTD.

Inventor： Dan LEV ,  Demitiri MIKITCHUK ,  Alon GAL

IPC: F03H1/00 ,  H05H1/54 ,  H01J27/02

Abstract: A heaterless hollow cathode provides electron emission current in an electric space propulsion system. A mechanical, thermal, and electromagnetic design of the cathode apparatus is presented, and a method of operation for rapid ignition and stabilization of the cathode is provided. The keeper of the cathode apparatus has a thickness change which reduces the flow of heat away from the cathode's emitter assembly. The method for heating the emitter assembly includes controlling applied voltages so that the current flowing from the emitter assembly to the keeper is maintained at a predetermined fixed value. By this method, damage to the electron emitting surfaces of the emitter assembly by electric arcing and/or by depletion of dopant materials is avoided.