中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

215 records (took 0.016 seconds)

    MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
    1.
    发明公开
    MULTI CHARGED PARTICLE BEAM WRITING APPARATUS 审中-公开

    公开(公告)号：US20240242919A1

    公开(公告)日：2024-07-18

    申请号：US18474329

    申请日：2023-09-26

    Applicant: NuFlare Technology, Inc.

    Inventor： Hirofumi MORITA

    IPC: H01J37/141 ,  G03F7/00 ,  G03F7/20 ,  H01J37/04 ,  H01J37/145 ,  H01J37/317

    CPC classification number: H01J37/141 ,  G03F7/2059 ,  G03F7/70191 ,  H01J37/045 ,  H01J37/145 ,  H01J37/3177

    Abstract: In one embodiment, a multi charged particle beam writing apparatus includes two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus a multi charged particle beam on a substrate, which has passed through a limiting aperture member, and three or more correction lenses correcting an imaging state of the multi charged particle beam on the substrate. The three or more correction lenses are comprised of a first magnetic correction lens, and two or more correction lenses, the two or more correction lenses are placed inside a lens magnetic field of one of the two or more-stage objective lenses, and one or no electrostatic correction lens is placed inside a magnetic field of each of the two or more-stage objective lenses.

    Operating a gas feed device for a particle beam apparatus
    2.
    发明授权
    Operating a gas feed device for a particle beam apparatus 有权

    公开(公告)号：US12002656B2

    公开(公告)日：2024-06-04

    申请号：US18230722

    申请日：2023-08-07

    Applicant: Carl Zeiss Microscopy GmbH

    Inventor： Andreas Schmaunz

    IPC: H01J37/32 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304

    CPC classification number: H01J37/32449 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/006 ,  H01J2237/2065

    Abstract: Operating a gas feed device for a particle beam apparatus includes predetermining a flow rate of a precursor through an outlet of a precursor reservoir containing the precursor to be fed onto an object, loading a temperature of the precursor reservoir, the temperature being associated with the predetermined flow rate, from a database into a control unit, setting a temperature of the precursor reservoir to the temperature loaded from the database using a temperature setting unit, and determining at least one functional parameter of the precursor reservoir depending on the flow rate and the temperature, loaded from the database, using the control unit and informing a user of the gas feed device about the determined functional parameter. Informing the user of the gas feed device about the functional parameter may include displaying the functional parameter on a display unit, outputting an optical signal, or outputting an acoustic signal.

    MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS
    3.
    发明公开
    MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS 审中-公开

    公开(公告)号：US20240145214A1

    公开(公告)日：2024-05-02

    申请号：US18504089

    申请日：2023-11-07

    Applicant: ASML Netherlands B.V.

    Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhong-wei CHEN ,  Martinus Gerardus Johannes Maria MAASSEN

    IPC: H01J37/317 ,  H01J37/145 ,  H01J37/28

    CPC classification number: H01J37/3177 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/0453

    Abstract: Systems and methods of mitigating Coulomb effect in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam along a primary optical axis, a first aperture array comprising a first plurality of apertures having shapes and configured to generate a plurality of primary beamlets derived from the primary charged-particle beam, a condenser lens comprising a plane adjustable along the primary optical axis, and a second aperture array comprising a second plurality of apertures configured to generate probing beamlets corresponding to the plurality of beamlets, wherein each of the plurality of probing beamlets comprises a portion of charged particles of a corresponding primary beamlet based on at least a position of the plane of the condenser lens and a characteristic of the second aperture array.

    MULTI-ELECTRON BEAM IMAGE ACQUIRING APPARATUS AND MULTI-ELECTRON BEAM IMAGE ACQUIRING METHOD
    4.
    发明公开
    MULTI-ELECTRON BEAM IMAGE ACQUIRING APPARATUS AND MULTI-ELECTRON BEAM IMAGE ACQUIRING METHOD 审中-公开

    公开(公告)号：US20240079200A1

    公开(公告)日：2024-03-07

    申请号：US18505216

    申请日：2023-11-09

    Applicant: NuFlare Technology, Inc.

    Inventor： Kazuhiko INOUE ,  Atsushi ANDO ,  Munehiro OGASAWARA

    IPC: H01J37/145 ,  H01J37/244

    CPC classification number: H01J37/145 ,  H01J37/244 ,  H01J2237/1508 ,  H01J2237/1516

    Abstract: A multi-electron beam image acquiring apparatus includes a stage configured to mount thereon a substrate, an illumination optical system configured to apply multiple primary electron beams to the substrate, a plurality of multipole lenses including at least two stages of multipole lenses, arranged at positions common to a trajectory of the multiple primary electron beams and a trajectory of multiple secondary electron beams which are emitted because the substrate is irradiated with the multiple primary electron beams and each configured to include at least four electrodes and at least four magnetic poles, and a multi-detector configured to detect the multiple secondary electron beams separated from the trajectory of the multiple primary electron beams, wherein one of the plurality of multipole lenses separates the multiple secondary electron beams from the trajectory of the multiple primary electron beams.

    Multiple charged-particle beam apparatus and methods
    5.
    发明授权
    Multiple charged-particle beam apparatus and methods 有权

    公开(公告)号：US11854765B2

    公开(公告)日：2023-12-26

    申请号：US16885872

    申请日：2020-05-28

    Applicant: ASML Netherlands B.V.

    Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-wei Chen ,  Martinus Gerardus Johannes Maria Maassen

    IPC: H01J37/317 ,  H01J37/145 ,  H01J37/28

    CPC classification number: H01J37/3177 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/0453

    Abstract: Systems and methods of mitigating Coulomb effect in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam along a primary optical axis, a first aperture array comprising a first plurality of apertures having shapes and configured to generate a plurality of primary beamlets derived from the primary charged-particle beam, a condenser lens comprising a plane adjustable along the primary optical axis, and a second aperture array comprising a second plurality of apertures configured to generate probing beamlets corresponding to the plurality of beamlets, wherein each of the plurality of probing beamlets comprises a portion of charged particles of a corresponding primary beamlet based on at least a position of the plane of the condenser lens and a characteristic of the second aperture array.

    PARTICLE BEAM COLUMN
    9.
    发明申请
    PARTICLE BEAM COLUMN 有权

    公开(公告)号：US20230065039A1

    公开(公告)日：2023-03-02

    申请号：US17896463

    申请日：2022-08-26

    Applicant: Carl Zeiss Microscopy GmbH

    Inventor： Erik Essers ,  Björn Gamm

    IPC: H01J37/145 ,  H01J37/28 ,  H01J37/147 ,  H01J37/244

    Abstract: A particle beam column generates a particle beam of charged particles, for example electrons or ions, and direct it onto a sample. The particle beam column comprises a multi-aperture stop and a deflection system for selectively steering the particle beam through one of a plurality of apertures provided in the multi-aperture stop. The apertures have different sizes in order to limit the current strength of the particle beam to different values. The particle beam column furthermore comprises a lens for changing the divergence angle of the particle beam upstream of a first stop. The lens can comprise a magnetic lens, which comprises a magnetic core with a plurality of parts, which are electrically insulated from one another and can have substantially different electrical potentials during operation. Some of the parts of the magnetic core can have the same electrical potential as the first stop during operation.

    Multi-beam inspection apparatus with single-beam mode
    10.
    发明授权
    Multi-beam inspection apparatus with single-beam mode 有权

    公开(公告)号：US11594396B2

    公开(公告)日：2023-02-28

    申请号：US16834778

    申请日：2020-03-30

    Applicant: ASML Netherlands B.V.

    Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-Wei Chen

    IPC: H01J37/20 ,  H01J37/317 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244

    Abstract: A multi-beam inspection apparatus supporting a plurality of operation modes is disclosed. The charged particle beam apparatus for inspecting a sample supporting a plurality of operation modes comprises a charged particle beam source configured to emit a charged particle beam along a primary optical axis, a movable aperture plate, movable between a first position and a second position, and a controller having circuitry and configured to change the configuration of the apparatus to switch between a first mode and a second mode. In the first mode, the movable aperture plate is positioned in the first position and is configured to allow a first charged particle beamlet derived from the charged particle beam to pass through. In the second mode, the movable aperture plate is positioned in the second position and is configured to allow the first charged particle beamlet and a second charged particle beamlet to pass through.

Patent Agency Ranking