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公开(公告)号:US20250166961A1
公开(公告)日:2025-05-22
申请号:US19029225
申请日:2025-01-17
Applicant: FIBICS INCORPORATED
Inventor: Michael William PHANEUF , Ken Guillaume LAGAREC
IPC: H01J37/26 , H01J37/22 , H01J37/28 , H01J37/30 , H01J37/304 , H01J37/305
Abstract: A method to compensate for drift while controlling a charged particle beam (CPB) system having at least one charged particle beam controllable in position. Sources of drift include mechanical variations in the stage supporting the sample, beam deflection shifts, and environmental impacts, such as temperature. The method includes positioning a sample supported by a stage in the CPB system, monitoring a reference fiducial on a surface of the sample from a start time to an end time, determining a drift compensation to compensate for a drift that causes an unintended change in the position of a first charged particle beam relative to the sample by a known amount over a period of time based on a change in the position of the reference fiducial between the start time and the end time, and adjusting positions of the first charged particle beam by applying the determined drift compensation during an operation of the CPB system.
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公开(公告)号:US12300462B2
公开(公告)日:2025-05-13
申请号:US18431847
申请日:2024-02-02
Applicant: Carl Zeiss MultiSEM GmbH
Inventor: Dirk Zeidler , Nico Kaemmer , Christian Crueger
Abstract: A system includes a multi-beam particle microscope for imaging a 3D sample layer by layer, and a computer system with a multi-tier architecture is disclosed. The multi-tier architecture can allow for an optimized image processing by gradually reducing the amount of parallel processing speed when data exchange between different processing systems and/or of data originating from different detection channels takes place. A method images a 3D sample layer by layer. A computer program product includes a program code for carrying out the method.
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公开(公告)号:US12300461B2
公开(公告)日:2025-05-13
申请号:US17822530
申请日:2022-08-26
Applicant: Carl Zeiss Microscopy GmbH
Inventor: Björn Gamm , Erik Essers
IPC: H01J37/28 , H01J37/10 , H01J37/244
Abstract: A particle beam device has a particle source, an extraction stop, an anode stop and a beam tube. A driver system of the particle beam device is configured to apply an electrical excitation stop potential to the extraction stop, to apply an electrical anode stop potential, able to be set in a variable manner, to the anode stop and to apply an electrical beam tube potential to the beam tube. A controller of the particle beam device is configured to control the driver system such that a voltage between the extraction stop and the anode stop is able to be set in a variable manner, as a result of which a current strength of the particle beam passing through the aperture of the anode stop is able to be set in a variable manner.
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公开(公告)号:US12293895B2
公开(公告)日:2025-05-06
申请号:US18379400
申请日:2023-10-12
Applicant: Carl Zeiss SMT GmbH
Inventor: Eugen Foca , Amir Avishai , Thomas Korb , Daniel Fischer
IPC: H01J37/147 , H01J37/10 , H01J37/26 , H01J37/28
Abstract: The present invention relates to a charged particle beam system comprising a deflection subsystem configured to deflect a charged particle beam in a deflection direction based on a sum of analog signals generated by separate digital to analog conversion of a first digital signal and a second digital signal. The present invention further relates to a method of configuring the charged particle beam system so that each of a plurality of regions of interest can be scanned by varying only the first digital signal while the second digital signal is held constant at a value associated with the respective region of interest. The present invention further relates to a method of recording a plurality of images of the regions of interest at the premise of reduced interference due to charge accumulation.
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公开(公告)号:US12272518B2
公开(公告)日:2025-04-08
申请号:US18213220
申请日:2023-06-22
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor: Ilya Blayvas
IPC: H01J37/28 , H01J37/22 , H01J37/26 , H01J37/305
Abstract: A method of evaluating a region of interest of a sample including: positioning the sample within in a vacuum chamber of an evaluation tool that includes a scanning electron microscope (SEM) column and a focused ion beam (FIB) column; acquiring a plurality of two-dimensional images of the region of interest by alternating a sequence of delayering the region of interest with a charged particle beam from the FIB column and imaging a surface of the region of interest with the SEM column; generating an initial three-dimensional data cube representing the region of interest by stacking the plurality of two-dimensional images on top of each other in an order in which they were acquired; identifying distortions within the initial three-dimensional data cube; and creating an updated three-dimensional data cube that includes corrections for the identified distortions.
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公开(公告)号:US20250112023A1
公开(公告)日:2025-04-03
申请号:US18829217
申请日:2024-09-09
Applicant: ASML Netherlands B.V.
Inventor: Weiming REN , Shuai LI , Xuedong LIU , Zhongwei CHEN
IPC: H01J37/28 , H01J37/12 , H01J37/147
Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
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公开(公告)号:US20250112019A1
公开(公告)日:2025-04-03
申请号:US18478972
申请日:2023-09-29
Applicant: FEI Company
Inventor: Alexander Henstra , Galen Gledhill , Ali Gheidari
IPC: H01J37/153 , H01J37/28
Abstract: Multipole elements and charged particle microscope systems including the same. In an example, an apparatus can include plurality of electrodes including a first shape subset and a second shape subset. Each electrode of the first shape subset includes an electrode active surface with a shape that is different than that of each electrode of the second shape subset. In another example, an apparatus can include a plurality of electrodes including a first side subset and a second side subset. Each electrode includes an electrode extension extending along a first lateral direction or a second lateral direction. In another example, an apparatus can include an optical column with a plurality of multipole elements that are fully contained within a first angular envelope that subtends a first angle that is at most 50 degrees while the working distance is at most 10 mm.
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公开(公告)号:US12261014B2
公开(公告)日:2025-03-25
申请号:US17859399
申请日:2022-07-07
Applicant: JEOL Ltd.
Inventor: Motohiro Nakamura , Takeyuki Kobayashi
Abstract: There is provided a scanning electron microscope which has a sample chamber capable of being evacuated to a low vacuum. The scanning electron microscope includes an electron gun for emitting an electron beam, an objective lens for focusing the emitted beam onto a sample, and a sample chamber in which the sample is housed. The objective lens includes an inner polepiece, an outer polepiece disposed outside the inner polepiece and facing the sample chamber, at least one through-hole extending through the inner and outer polepieces, and at least one cover member that closes off the through-hole. An opening is formed between the inner polepiece and the outer polepiece. The objective lens causes leakage of magnetic field from the opening toward the sample. The sample chamber has a degree of vacuum lower than that in an inner space that forms an electron beam path inside the inner polepiece.
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公开(公告)号:US20250095955A1
公开(公告)日:2025-03-20
申请号:US18370303
申请日:2023-09-19
Applicant: Applied Materials Israel Ltd.
Inventor: Konstantin Chirko , Itamar Shani , Lior Yaron , Guy Eytan
IPC: H01J37/26 , G01N23/203 , G01N23/2251 , H01J37/22 , H01J37/244 , H01J37/28
Abstract: Disclosed are method and system for calibrating a tilt angle of an electron beam of a backscattered scanning electron microscope including scanning a bare wafer at a plurality of electron beam tilt and azimuth angles, thereby obtaining a calibration map representing a crystal orientation of the bare wafer, selecting a tilt angle and defining an expected diffraction pattern associated with the tilt angle, based on the calibration map; scanning a patterned wafer at the selected tilt angle, comparing the diffraction pattern of the image obtained from the scanning of the patterned wafer at the selected tilt angle with the expected diffraction pattern; correcting the tilt angle of the electron beam of the BSEM tool, such that the diffraction pattern of the image obtained during scanning of the patterned wafer will align with the expected diffraction pattern.
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公开(公告)号:US12255040B2
公开(公告)日:2025-03-18
申请号:US17215995
申请日:2021-03-29
Applicant: Carl Zeiss MultiSEM GmbH
Inventor: Dirk Zeidler , Christof Riedesel , Arne Thoma , Georgo Metalidis , Joerg Jacobi , Stefan Schubert , Ralf Lenke , Ulrich Bihr , Yanko Sarov , Georg Kurij
IPC: H01J37/147 , H01J37/09 , H01J37/141 , H01J37/153 , H01J37/28
Abstract: A method of operating a multi-beam particle beam system includes: generating a multiplicity of particle beams such that they each pass through multipole elements that are either intact or defective; focusing the particle beams in a predetermined plane; determining excitations for the deflection elements of the multipole elements; exciting the deflection elements of the multipole elements that are intact with the determined excitations; modifying the determined excitations for the deflection elements of the multipole elements that are defective; and exciting the deflection elements of the defective multipole elements with the modified excitations. Modifying the determined excitations includes adding corrective excitations to the determined excitations. The corrective excitations are the same for all deflection elements of the defective multipole element.
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