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公开(公告)号：US20250125139A1
公开(公告)日：2025-04-17
申请号：US18682040
申请日：2022-06-23
Applicant: NEXTIN, INC.
Inventor： Seoung-Ju NA , Heung-Gyoon PARK
Abstract: An apparatus for removing static electricity of a semiconductor substrate, which removes static electricity embedded inside a thin film on the semiconductor substrate by emitting vacuum ultraviolet (VUV) light to the semiconductor substrate disposed inside a vacuum chamber. The apparatus includes: a VUV generator disposed at an upper side of the vacuum chamber and provided with a VUV lamp configured to emit small-area VUV light into an inside of the vacuum chamber; and a light diffusion unit disposed below the VUV generator and configured to diffuse incident VUV light into a wide area and output the diffused VUV light to the semiconductor substrate disposed below the light diffusion unit.
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公开(公告)号：US12257449B2
公开(公告)日：2025-03-25
申请号：US16984375
申请日：2020-08-04
Applicant: Moshe Shterzer
Inventor： Moshe Shterzer
Abstract: An IPL apparatus utilizing a Pulse Forming Network (PFN) for generating a plurality of light pulse sequences, comprising a treatment unit comprising one or more lamps adapted to emit a plurality of light pulses towards a treatment face of the IPL apparatus, a PFN and a control unit adapted to operate the PFN to generate a regulated energized pulse driven to the lamp(s). The regulated energized pulse having a desired multi-level voltage waveform with a maximum voltage level and a minimum voltage level which is in a range of 30-50 percent of the maximum voltage level. Rapidly varying heat is induced by a sequence of the plurality of light pulses emitted by the lamp(s) according to the multi-level voltage waveform.
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公开(公告)号：US20250095980A1
公开(公告)日：2025-03-20
申请号：US18969965
申请日：2024-12-05
Applicant: Xenex Disinfection Services Inc.
Inventor： Mark A. Stibich , James B. Wolford , Alexander N. Garfield , Martin Rathgeber , Eric M. Frydendall
Abstract: Apparatuses are disclosed which include a lamp assembly having a germicidal lamp configured to emit ultraviolet light and a base supporting the germicidal lamp. The apparatuses further include a support structure holding operational components for the apparatus and an automated actuator for moving the base and the germicidal lamp relative to the support structure. In addition, the apparatuses include a processor and a storage medium having program instructions which are executable by the processor for activating the automated actuator such that the base and the germicidal lamp are repositioned relative to the support structure while the germicidal lamp is emitting ultraviolet light.
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公开(公告)号：US20240363326A1
公开(公告)日：2024-10-31
申请号：US18688346
申请日：2022-08-31
Applicant: Eric C. Bretschneider
Inventor： Eric C. Bretschneider
CPC classification number: H01J63/06 , H01J61/025 , H01J2893/0031
Abstract: A cathode-ray ultraviolet light source comprising: an elongated glass envelope having a first end and second end, the glass envelope defining an evacuated volume; an electron gun positioned within the evacuated volume proximate to the first end and being capable of developing an electron beam; a target disposed within the evacuated volume between the first and second end of the glass envelope, the target comprising a phosphor material covered with a reflective metal film; and an electron beam focusing and deflecting mechanism disposed within the evacuated volume between the electron gun and the target to direct the electron beam towards the reflective metal film of the target.
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公开(公告)号：US12125695B2
公开(公告)日：2024-10-22
申请号：US17795775
申请日：2021-01-26
Applicant: Cymer, LLC
Inventor： Thomas Dickson Steiger
CPC classification number: H01J61/30 , F16C19/06 , F16C35/04 , H01J61/025 , H01J61/16 , H01J61/52 , H01S3/036 , H01S3/225
Abstract: A light source apparatus (100) includes: a chamber (101) having a chamber wall (103) defining an opening (107); and a support apparatus (110) including a support device (111) positioned within the opening of the chamber wall. The support device includes: a cup (112) having an inner surface (114) configured to retain a movable apparatus and an outer surface (116) having a first outer diameter; and a plurality of rods (118) arranged at the outer surface of the cup such that the arrangement of the plurality of rods defines a second outer diameter, the second outer diameter greater than the first outer diameter. The chamber wall is configured to hold the support device such that the chamber wall contacts the plurality of rods when the support device is positioned within the opening of the chamber wall, and the outer surface of the cup does not contact the chamber wall.
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Patent Agency Ranking
6.发明公开公开(公告)号：US20230355821A1
公开(公告)日：2023-11-09
申请号：US18246241
申请日：2021-10-12
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： Timothy J. Hebrink , John A. Wheatley , Bharat R. Acharya
IPC: A61L2/26 , B32B27/30 , B32B27/08 , B32B27/18 , A61L2/10 , G02B5/20 , G02B5/08 , G02B1/04 , H01J61/02
CPC classification number: A61L2/26 , B32B27/304 , B32B27/08 , B32B27/18 , A61L2/10 , G02B5/208 , G02B5/0891 , G02B1/04 , H01J61/025 , B32B2255/20 , B32B2255/28 , B32B2264/1022 , B32B2255/10 , B32B2551/00 , A61L2202/11
Abstract: Multilayer articles are provided, including an absorbent layer and an ultraviolet mirror containing at least a plurality of alternating first and second optical layers. The absorbent layer absorbs ultraviolet light having a wavelength between at least 230 nanometers (nm) and 400 nm. The ultraviolet mirror reflects ultraviolet light in a wavelength range from 190 nm to 240 nm. Systems are also provided including a broadband UVC light source and a multilayer article. Devices are provided including a chamber, a broadband UVC light source located within the chamber, an absorbent layer in the chamber, and an ultraviolet mirror between the light source and absorbent layer. Methods of disinfecting a material are further provided, including obtaining a system or device, directing UVC light at the ultraviolet mirror, and exposing the material to ultraviolet light in a wavelength range from 190 nm to 240 nm, reflected by the ultraviolet mirror towards the material.
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公开(公告)号：US11764053B1
公开(公告)日：2023-09-19
申请号：US18046262
申请日：2022-10-13
Applicant: mb-microtec ag
Inventor： Karsten Richter , Philipp Michel , Remo Pfaff
CPC classification number: H01J61/302 , G21H3/02 , H01J61/025 , H01J61/12 , H01J65/00 , F41G1/345
Abstract: A lighting element with a gaseous tritium light source and an elongated plastic housing that at least partially encloses the gaseous tritium light source with its housing shell and forms a latching element that snaps together with the gaseous tritium light source, which can be inserted into the plastic housing, and holds it in the plastic housing. A rugged lighting element can be produced if the latching element is formed by at least one catch element, which catch element has a radially sprung flexible spring and at least one, preferably two, inwardly oriented snaps with an indentation for snapping together with the gaseous tritium light source.
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公开(公告)号：US11694888B2
公开(公告)日：2023-07-04
申请号：US17785739
申请日：2020-12-15
Applicant: Ushio Denki Kabushiki Kaisha
Inventor： Hideaki Yagyu
CPC classification number: H01J61/025 , H01J61/16
Abstract: An ultraviolet irradiation device includes: a lamp house having at least one surface formed with a light extraction surface; an excimer lamp that is accommodated in the lamp house at a position apart from the light extraction surface in a first direction, the excimer lamp emitting ultraviolet light having a main emission wavelength belonging to a first wavelength band of 190 nm or more and 225 nm or less; a pair of electrodes that applies a voltage to a light-emitting tube of the excimer lamp; an optical filter that is disposed on the light extraction surface, and that substantially transmits the ultraviolet light having the first wavelength band and substantially fails to transmit ultraviolet light having a wavelength of 240 nm or more and 300 nm or less; and a light diffuser that is disposed between the excimer lamp and the optical filter in the lamp house in the first direction, for diffusing and reflecting light incident on the light diffuser.
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公开(公告)号：US20230100079A1
公开(公告)日：2023-03-30
申请号：US18061292
申请日：2022-12-02
Inventor： Young Beom KIM , Yong Hyun LIM , Sung Keun PARK , Han Sam LEE
IPC: A61L2/10 , A61L2/26 , A61L2/24 , A61L2/22 , E03D9/00 , H01J61/16 , H05B47/17 , H05B41/36 , H01J61/02
Abstract: Provided is a portable IPL sterilizer comprising: a body partitioned into a central region and a peripheral region surrounding at least a portion of the central region; a xenon lamp light source for sterilization provided in the central region of the body; and a light-shielding comb part provided in the peripheral region of the body.
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公开(公告)号：US20230054791A1
公开(公告)日：2023-02-23
申请号：US17785739
申请日：2020-12-15
Applicant: Ushio Denki Kabushiki Kaisha
Inventor： Hideaki Yagyu
Abstract: An ultraviolet irradiation device includes: a lamp house having at least one surface formed with a light extraction surface; an excimer lamp that is accommodated in the lamp house at a position apart from the light extraction surface in a first direction, the excimer lamp emitting ultraviolet light having a main emission wavelength belonging to a first wavelength band of 190 nm or more and 225 nm or less; a pair of electrodes that applies a voltage to a light-emitting tube of the excimer lamp; an optical filter disposed on the light extraction surface, and that substantially transmits the ultraviolet light having the first wavelength band and substantially fails to transmit ultraviolet light having a wavelength of 240 nm or more and 300 nm or less; and a light diffuser that is disposed between the excimer lamp and the optical filter in the lamp house in the first direction.
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