中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

356 records (took 0.023 seconds)

    SWIRLER FOR LASER-SUSTAINED PLASMA LIGHT SOURCE WITH REVERSE VORTEX FLOW
    1.
    发明申请
    SWIRLER FOR LASER-SUSTAINED PLASMA LIGHT SOURCE WITH REVERSE VORTEX FLOW 有权

    公开(公告)号：US20230053035A1

    公开(公告)日：2023-02-16

    申请号：US17880455

    申请日：2022-08-03

    Applicant: KLA Corporation

    Inventor： Ilya Bezel ,  Leonid Borisovich Zvedenuk ,  Andrey Evgenievich Stepanov ,  Amir Torkaman

    IPC: H01J65/04 ,  H01J61/02 ,  H01J61/28 ,  H01J61/52

    Abstract: A plasma lamp for use in a laser-sustained plasma (LSP) light source is disclosed. The plasma lamp includes a gas containment structure for containing a gas, a gas seal positioned at a base of the gas containment structure, a gas inlet, and a gas outlet. The plasma lamp includes a gas swirler including a set of nozzles configured to generate a vortex gas flow and a swirler shaft including an inlet channel for delivering the gas from the gas inlet to the nozzles and an outlet channel for delivering the gas from the gas containment structure to the gas outlet. The plasma lamp includes a distributor including one or more plenums to distribute the gas from the gas inlet into the swirler. The plasma lamp may also include a deflector fluidically coupled to the swirler shaft and extending above the set of nozzles and configured to direct gas flow around the swirler.

    Laser sustained plasma light source with high pressure flow
    2.
    发明授权
    Laser sustained plasma light source with high pressure flow 有权

    公开(公告)号：US11450521B2

    公开(公告)日：2022-09-20

    申请号：US17157782

    申请日：2021-01-25

    Applicant: KLA Corporation

    Inventor： Anatoly Shchemelinin

    IPC: H01J61/02 ,  H01J61/16 ,  H01J61/52 ,  H01J61/28

    Abstract: A broadband radiation source is disclosed. The source may include a gas containment vessel configured to maintain a plasma and emit broadband radiation. The source may also include a recirculation gas loop fluidically coupled to the gas containment vessel. The recirculation gas loop may be configured to transport gas from one or more gas boosters configured to pressurize the low-pressure gas into a high-pressure gas and transport the high-pressure gas to the recirculation loop via an outlet. The system includes a pressurized gas reservoir fluidically coupled to the outlet of the one or more gas boosters and is configured to receive and store high pressure gas from the one or more gas boosters. The source includes a pressurized gas reservoir located between the one or more gas boosters and the gas containment vessel and is configured to receive and store high pressure gas from the one or more gas boosters.

    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND PLASMA POSITION ADJUSTING METHOD
    3.
    发明申请
    EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND PLASMA POSITION ADJUSTING METHOD 有权

    公开(公告)号：US20210327701A1

    公开(公告)日：2021-10-21

    申请号：US17225595

    申请日：2021-04-08

    Applicant: Ushio Denki Kabushiki Kaisha

    Inventor： Noritaka ASHIZAWA

    IPC: H01J61/06 ,  H01J61/02 ,  H01J61/28 ,  G03F7/20

    Abstract: An extreme ultraviolet light source apparatus includes a disc-shaped cathode rotating about an axis, a disc-shaped anode rotating about an axis, an energy beam irradiation device irradiating a plasma raw material on the cathode with an energy beam to vaporize the plasma raw material, a power supply for causing a discharge between the cathode and the anode for generating a plasma in the gap between the cathode and the anode to emit extreme ultraviolet light, and an irradiation position adjusting mechanism for adjusting a position at which the cathode is irradiated with the energy beam. The cathode, the anode, and the irradiation position adjusting mechanism are accommodated in a housing. A photography device is disposed outside the housing and is configured to photograph a visible-light image of a vicinity of the cathode and the anode, the vicinity including visible light emitted from the plasma.

    LASER SUSTAINED PLASMA LIGHT SOURCE WITH HIGH PRESSURE FLOW
    4.
    发明申请
    LASER SUSTAINED PLASMA LIGHT SOURCE WITH HIGH PRESSURE FLOW 有权

    公开(公告)号：US20210242009A1

    公开(公告)日：2021-08-05

    申请号：US17157782

    申请日：2021-01-25

    Applicant: KLA Corporation

    Inventor： Anatoly Shchemelinin

    IPC: H01J61/02 ,  H01J61/28 ,  H01J61/52 ,  H01J61/16

    Abstract: A broadband radiation source is disclosed. The source may include a gas containment vessel configured to maintain a plasma and emit broadband radiation. The source may also include a recirculation gas loop fluidically coupled to the gas containment vessel. The recirculation gas loop may be configured to transport gas from one or more gas boosters configured to pressurize the low-pressure gas into a high-pressure gas and transport the high-pressure gas to the recirculation loop via an outlet. The system includes a pressurized gas reservoir fluidically coupled to the outlet of the one or more gas boosters and is configured to receive and store high pressure gas from the one or more gas boosters. The source includes a pressurized gas reservoir located between the one or more gas boosters and the gas containment vessel and is configured to receive and store high pressure gas from the one or more gas boosters.

    Ion source devices and methods
    7.
    发明授权
    Ion source devices and methods 有权
    离子源设备和方法

    公开(公告)号：US09257285B2

    公开(公告)日：2016-02-09

    申请号：US13591291

    申请日：2012-08-22

    Applicant: Frank Goerbing

    Inventor： Frank Goerbing

    IPC: H01J17/26 ,  H01J61/28 ,  H01J1/14 ,  H01L21/265 ,  H01J37/08 ,  H01J37/317 ,  H01J27/08

    CPC classification number: H01J37/08 ,  H01J27/08 ,  H01J37/317 ,  H01J37/3171 ,  H01L21/265

    Abstract: An ion source includes a chamber defining an interior cavity for ionization, an electron beam source at a first end of the interior cavity, an inlet for introducing ionizable gas into the chamber, and an arc slit for extracting ions from the chamber. The chamber includes an electrically conductive ceramic.

    Abstract translation: 离子源包括限定用于电离的内腔的腔室，在内腔的第一端处的电子束源，用于将可电离气体引入腔室的入口和用于从腔室中提取离子的弧缝。 该腔室包括导电陶瓷。

    Laser-sustained plasma light source
    8.
    发明授权
    Laser-sustained plasma light source 有权
    激光持续等离子体光源

    公开(公告)号：US09099292B1

    公开(公告)日：2015-08-04

    申请号：US12787827

    申请日：2010-05-26

    Applicant: Ilya Bezel ,  Anatoly Shchemelinin ,  Yanming Zhao ,  Gildardo R. Delgado

    Inventor： Ilya Bezel ,  Anatoly Shchemelinin ,  Yanming Zhao ,  Gildardo R. Delgado

    IPC: H01J1/02 ,  H01J61/28 ,  H01J61/52 ,  H01J61/54

    CPC classification number: H05H1/24 ,  H01J1/025 ,  H01J23/033 ,  H01J61/09 ,  H01J61/28 ,  H01J61/52 ,  H01J61/54 ,  H01J61/545 ,  H01J65/042

    Abstract: A laser sustained plasma light source having a cell formed as a continuous tube with a circular cross section, a gas volume contained within the cell, at least one laser directed into the gas volume, for sustaining a plasma within the gas volume, the plasma producing a light, where the gas volume is heated as it leaves the plasma, cools as it circulates around the continuous tube of the cell, and reenters the plasma cooler than when it left the plasma and in a laminar flow, and a reflector for collecting the light and providing the light to a desired location.

    Abstract translation: 一种激光持续等离子体光源，其具有形成为圆形横截面的连续管的单元，容纳在该单元内的气体体积，至少一个引导到气体体积中的激光，用于维持气体体积内的等离子体，等离子体产生 气体体积在离开等离子体时被加热的光在其围绕电池的连续管周围循环时冷却，并且比等离子体离开等离子体和层流时重新进入等离子体冷却器，以及用于收集等离子体的反射器 光并将光提供到所需位置。

    Method for operating an amalgam lamp
    9.
    发明授权
    Method for operating an amalgam lamp 有权
    汞齐灯操作方法

    公开(公告)号：US09048083B2

    公开(公告)日：2015-06-02

    申请号：US13635156

    申请日：2011-03-14

    Applicant: Alex Voronov

    Inventor： Alex Voronov

    IPC: H01J7/24 ,  H01J61/28 ,  H01J61/52 ,  H01J61/72

    CPC classification number: H01J61/28 ,  H01J61/523 ,  H01J61/72

    Abstract: In a known method for operating an amalgam lamp having a nominal power Poptimum, it is provided that a lamp voltage Uoptimum designed for a maximum UVC emission is applied between electrodes or a lamp current Ioptimum designed for a maximum UVC emission flows between electrodes. The discharge space is accessible for an amalgam deposit, which is heatable by a heating element in which a heating current Iheating is conducted through the heating element. Starting from this background, in order to provide an operating mode that ensures a stable operation in the region of the optimum power, it is proposed that a target value of the lamp current Itarget is set that is less than Ioptimum and that the heating current Iheating is turned on or increased when the lamp current falls below a lower limit I1 and is turned off or reduced when it exceeds an upper limit I2 for the lamp current.

    Abstract translation: 在用于操作具有标称功率Poptimum的汞齐灯的已知方法中，提供了设计用于最大UVC发射的灯电压U最佳值被施加在电极之间或设计用于电极之间的最大UVC发射流动的灯电流Ioptimum。 放电空间可用于汞齐沉积物，其可通过加热元件加热，其中通过加热元件进行加热电流加热。 从该背景开始，为了提供确保在最佳功率区域中的稳定操作的操作模式，提出将灯电流目标值设定为小于最大值，并且加热电流Iheating 当灯电流下降到下限I1以下时，导通或增加，并且当灯电流超过灯电流的上限I2时，其被关断或减小。

Patent Agency Ranking