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Invention Publication
CN105255246A 面漆组合物和光刻方法 有权

面漆组合物和光刻方法
Abstract:
本发明提供的面漆组合物可以用于沉浸式光刻中以形成光抗蚀剂图形。所述面漆组合物包括溶剂系统，该溶剂系统包含1)由化学式(I)表示的第一有机溶剂，其中R1和R2为3-8个碳的烷基并且R1和R2的碳的总数目大于6；以及2)第二有机溶剂，所述第二有机溶剂是C4至C10一羟基醇。
Abstract(English):

Topcoat compositions are provided that can be used in immersion lithography to form photoresist patterns. The topcoat compositions include a solvent system that comprises 1) a first organic solvent represented by formula (I), wherein R1 and R2 are alkyl groups of 3-8 carbons and the total number of carbons of R1 and R2 is greater than 6; and 2) a second organic solvent that is a C4 to C10 monovalent alcohol.

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