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Invention Grant
CN105700292B 纳米压印模板的制作方法及纳米压印模板 有权

纳米压印模板的制作方法及纳米压印模板
Abstract:
本发明提供一种纳米压印模板的制作方法及纳米压印模板。本发明的纳米压印模板的制作方法，先在圆柱状的硬质滚筒的外圆周面上包覆一层软性的具有纳米线栅结构的膜片，形成纳米线栅结构膜层，得到中间筒体，然后利用低熔点焊料合金在所述中间筒体的外圆周面上沿所述纳米线栅结构膜层的纳米线栅结构形成一层结构硬化层，得到具有纳米线栅结构的纳米压印模板；通过在软质的纳米线线栅结构上形成一层硬质的结构硬化层，对软质的纳米线线栅结构进行硬化，从而克服在压印过程中微结构材质本身硬度不够的问题，使得卷对卷微结构压印，特别是纳米线栅压印成为实际工艺中可行的一部分，进而提高线栅偏光片的制作效率。
Abstract(English):

The present invention provides a manufacture method of a nano-imprint lithography template and a nano-imprint lithography template. In the manufacture method of the nano-imprint lithography template, first, the soft membrane having a nanowire gate structure is wrapped on the outer circumferential surface of the cylindric hard roller to form the nanowire gate structure film layer to obtain the temporary roller. Then, the low melting point solder alloy is utilized to form the structure hardened layer on the outer circumferential surface of the temporary roller along the nanowire gate structure of the nanowire gate structure film layer to obtain the nano-imprint lithography template having the nanowire gate structure. By forming the hard structure hardened layer on the soft nanowire gate structure for hardening the soft nanowire gate structure, the issue that the hardness of the micro structure material itself in the imprint procedure is not enough is overcame.

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