The invention discloses a thin film fabrication method and system, relates to the technical field of thin film fabrication and is used for improving thickness uniformity of the fabricated thin film. The thin film fabrication method comprises the steps of forming an ink layer covering a surface of a substrate on the substrate, and blowing air to the ink layer so that a solvent in the ink layer is diffused towards a surrounding region of the substrate; and removing the solvent in the ink layer so that a film formation material in the ink layer forms the thin film covered on the surface of the substrate. The thin film fabrication system comprises the thin film fabrication method provided by the technical scheme. The thin film fabrication method provided by the invention is used for fabricating the thin film.