The present invention discloses a fluorine injection technology stability test method based on a capacitor structure. The problem of the current monitoring of the fluorine injection technology stability is mainly solved. The realization scheme comprises: preparing a fluorine injection capacitor, and measuring the flat-band voltage Vfb(t0) of the capacitor; applying reversal stress with the duration of tk to the capacitor, and performing monitoring and statistics of current I1(t) of the ohmic electrode and the current I2(t) of the gate electrode of the capacitor; and finally measuring the flat-band voltage Vfb(tk-1) and the flat-band voltage Vfb(tk) of the capacitor after applying the stress, and calculating and obtaining the equivalent position d(tk) of an ionization fluorinion in a capacitor barrier layer spacing from the gate electrode. The fluorine injection technology stability test method based on the capacitor structure is easy to prepare a test capacitor, simple and reliable in test method and accurate in test result, and can be used for improving the fluorine injection technology stability and the long-term reliability of a device.