The invention relates to a preparation method of a solar cell. The preparation method comprises the following steps: texturing and cleaning the surface of a silicon wafer; growing a mask in a main grid region of the front surface of the silicon wafer; preparing an emitter on the front surface of the silicon wafer; depositing a silicon nitride film on the emitter, and growing a mask in a back electrode region of the back of the silicon wafer; printing a back electrode on the mask of the back of the silicon wafer; printing a back electric field on the back of the silicon wafer; printing a main grid in the main grid region and on the silicon nitride film, and printing a fine grid on the silicon nitride film; and sintering the silicon wafer, so that the solar cell is prepared. The preparationmethod provided by the invention has the advantages that the masks are grown in the electrode regions, and defects produced in silicon by silver in the electrodes are reduced; the preparation method can be realized in the conventional production line, fewer steps are added, and cost is not obviously increased; and the prepared solar cell is low in breakage rate and high in conversion efficiency.