中科微点-全球专利检索

  1. Login
  2. Sign Up
Invention Grant
CN109207939B 一种γ-TiAl合金表面的NiCrAlSi/CeO2掺杂YSZ涂层及其制备方法 有权

一种γ-TiAl合金表面的NiCrAlSi/CeO2掺杂YSZ涂层及其制备方法
Abstract:
本发明公开了一种γ‑TiAl合金表面的NiCrAlSi/CeO2掺杂YSZ涂层及其制备方法，该涂层包括自下而上依次设在基体上的NiCrAlSi沉积层、等离子渗氧陶瓷膜、CeO2掺杂YSZ隔热层。其制备方法为：对γ‑TiAl合金基体表面进行预处理；利用等离子刻蚀技术在基体表面形成峰形阵列微结构；利用多弧等离子镀技术在基体上进行NiCrAlSi沉积层；采用等离子渗氧的方法在表面形成一层致密的等离子渗氧陶瓷薄膜；采用多弧等离子镀技术在上述所得涂层上及进行CeO2掺杂YSZ沉积。本发明提高了γ‑TiAl合金与NiCrAlSi/CeO2掺杂YSZ涂层的结合强度。
Abstract(English):

A NiCrAlSi/CeO2 doped YSZ coating on the surface of a gamma-TiAl alloy and a preparing method thereof are disclosed. The coating includes a NiCrAlSi deposit layer, a plasma oxygen penetrated ceramic film and a CeO2 doped YSZ heat insulating layer which are arranged on a substrate in order from bottom to top. The method includes pretreating the surface of the gamma-TiAl alloy substrate; forming a peak-shaped array microstructure on the substrate surface by utilizing a plasma etching technique; forming the NiCrAlSi deposit layer on the substrate by utilizing a multi-arc plasma plating technique;forming the dense plasma oxygen penetrated ceramic film on the surface by utilizing a plasma oxygen penetration process; and depositing the CeO2 doped YSZ on the obtained coating by utilizing a multi-arc plasma plating technique. The bonding strength between the gamma-TiAl alloy and the NiCrAlSi/CeO2 doped YSZ coating is improved.

Public/Granted literature
Patent Agency Ranking
0/0