Invention Grant
- Patent Title: Method for forming fine patterns
-
Application No.: US15348305Application Date: 2016-11-10
-
Publication No.: US10005100B2Publication Date: 2018-06-26
- Inventor: Eun Ae Kwak , Min Hyuck Kang , Gug Rae Jo
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2016-0070404 20160607
- Main IPC: B05D3/00
- IPC: B05D3/00 ; B05D1/00 ; B05D3/12 ; G02B5/30 ; G02F1/1335 ; G02F1/1368 ; H01L27/12 ; H01L29/786

Abstract:
A method of forming fine patterns includes the steps of forming a conductive layer on a base part, forming a sacrificial layer including an adhesive material on the conductive layer, the adhesive material including a catechol group, forming resist patterns on the sacrificial layer, and forming fine patterns by patterning the conductive layer using the resist patterns as a mask.
Public/Granted literature
- US20170348729A1 METHOD FOR FORMING FINE PATTERNS Public/Granted day:2017-12-07
Information query