Invention Grant
- Patent Title: Microsample stage and method of manufacturing the same
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Application No.: US15181702Application Date: 2016-06-14
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Publication No.: US10014155B2Publication Date: 2018-07-03
- Inventor: Tatsuya Asahata , Akito Mori , Asumi Yuzuriha
- Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
- Applicant Address: JP
- Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2015-121312 20150616
- Main IPC: H01J37/20
- IPC: H01J37/20 ; H01J37/28

Abstract:
A microsample stage which fixes microsamples when the microsamples are analyzed by an analyzer includes a base, and middle supports which protrude from an upper surface of the base. A microsample-fixing portion protrudes from an upper surface of each middle support. An alignment mark associated with each microsample-fixing portion is configured to be recognized by a capturing image to determine a position of attachment of one or more microsamples to each microsample-fixing portion. The microsample stage is made by etching a silicon member, which can be automated to increase work efficiency.
Public/Granted literature
- US20160372301A1 MICROSAMPLE STAGE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2016-12-22
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