Invention Grant
- Patent Title: Scanning electron microscope and method for controlling same
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Application No.: US15304869Application Date: 2015-04-20
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Publication No.: US10014160B2Publication Date: 2018-07-03
- Inventor: Kaori Shirahata , Daisuke Bizen , Makoto Sakakibara , Yasunari Sohda , Hajime Kawano , Hideyuki Kazumi
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- Priority: JP2014-087432 20140421
- International Application: PCT/JP2015/061936 WO 20150420
- International Announcement: WO2015/163266 WO 20151029
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/26 ; G01N23/2251

Abstract:
The scanning electron microscope includes: an electron source; a first deflector for deflecting a primary electron beam emitted from the electron source; a second deflector for focusing the primary electron beam deflected by the first deflector and deflecting a second electron from a sample, which is generated the focused primary electron beam, to the outside of the optical axis; a voltage applying unit for applying a negative voltage to the sample to decelerate the primary electron beam; a spectrometer for dispersing the secondary electron; a detector for detecting the secondary electron passing through the spectrometer; an electrostatic lens provided between the second deflector and the spectrometer; and a voltage control unit that controls the voltage applied to the electrostatic lens based on the negative voltage applied to the sample. The electrostatic lens allows the deflecting action to be overlapped with the converging action.
Public/Granted literature
- US20170186583A1 SCANNING ELECTRON MICROSCOPE AND METHOD FOR CONTROLLING SAME Public/Granted day:2017-06-29
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