Invention Grant
- Patent Title: Optical method and system for critical dimensions and thickness characterization
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Application No.: US14655791Application Date: 2013-12-26
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Publication No.: US10054423B2Publication Date: 2018-08-21
- Inventor: Dror Shafir , Gilad Barak , Shay Wolfling
- Applicant: NOVA MEASURING INSTRUMENTS LTD.
- Applicant Address: IL Rehovot
- Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee Address: IL Rehovot
- Agency: Browdy and Neimark, PLLC
- International Application: PCT/IL2013/051075 WO 20131226
- International Announcement: WO2014/102792 WO 20140703
- Main IPC: G01B11/02
- IPC: G01B11/02 ; G01N21/47 ; G01N21/956 ; G02B21/36

Abstract:
Method and system for measuring one or more parameters of a patterned structure, using light source producing an input beam of at least partially coherent light in spatial and temporal domains, a detection system comprising a position sensitive detector for receiving light and generating measured data indicative thereof, an optical system configured for focusing the input light beam onto a diffraction limited spot on a sample's surface, collecting an output light returned from the illuminated spot, and imaging the collected output light onto a light sensitive surface of the position sensitive detector, where an image being indicative of coherent summation of output light portions propagating from the structure in different directions.
Public/Granted literature
- US20150345934A1 OPTICAL METHOD AND SYSTEM FOR CRITICAL DIMENSIONS AND THICKNESS CHARACTERIZATION Public/Granted day:2015-12-03
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