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公开(公告)号：US20210217581A1
公开(公告)日：2021-07-15
申请号：US17170938
申请日：2021-02-09
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： VLADIMIR MACHAVARIANI , MICHAEL SHIFRIN , DANIEL KANDEL , VICTOR KUCHEROV , IGOR ZISELMAN , RONEN URENSKI , MATTHEW SENDELBACH
Abstract: A metrology method for use in determining one or more parameters of a three-dimensional patterned structure, the method including performing a fitting procedure between measured TEM image data of the patterned structure and simulated TEM image data of the patterned structure, determining a measured Lamellae position of at least one measured TEM image in the TEM image data from a best fit condition between the measured and simulated data, and generating output data indicative of the simulated TEM image data corresponding to the best fit condition to thereby enable determination therefrom of the one or more parameters of the structure.
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公开(公告)号：US10663408B2
公开(公告)日：2020-05-26
申请号：US16524296
申请日：2019-07-29
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Gilad Barak , Dror Shafir , Yanir Hainick , Shahar Gov
IPC: G01N21/956 , G03F7/20 , G01N21/95
Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.
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公开(公告)号：US20200058118A1
公开(公告)日：2020-02-20
申请号：US16571120
申请日：2019-09-15
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： BOAZ BRILL
Abstract: A system for use in inspection of patterned structures, including a data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and a data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.
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公开(公告)号：US20200057005A1
公开(公告)日：2020-02-20
申请号：US16558212
申请日：2019-09-02
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： GILAD BARAK , ODED COHEN , IGOR TUROVETS
IPC: G01N21/956 , G01N21/95 , G01N21/88 , H01L21/66
Abstract: A test structure for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis, the test structure comprising a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some of those features of the main pattern, parameters of which are to be controlled during metrology measurements.
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公开(公告)号：US10534275B2
公开(公告)日：2020-01-14
申请号：US15739250
申请日：2016-06-22
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Cornel Bozdog , Aron Cepler , Paul Isbester
IPC: G03F7/20 , G01N21/956 , G01N21/21 , H01L21/66 , H01L21/8234
Abstract: A method and system are presented for use in controlling a multiple patterning process of n patterning stages subsequently applied to a sample to produce a target pattern thereon. The method comprises: providing intermediate measured data indicative of an optical response of the sample after being patterned by m-th patterning stage, 1≤m
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Patent Agency Ranking
6.发明申请公开(公告)号：US20190339068A1
公开(公告)日：2019-11-07
申请号：US16462247
申请日：2016-11-23
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： DANNY GROSSMAN , SHAHAR GOV , MOSHE VANHOTSKER , GUY ENGEL , ELAD DOTAN
Abstract: An optical system and method are presented for use in measurements on an upper surface of a layered sample when located in a measurement plane. The optical system is configured as a normal-incidence system having an illumination channel and a collection channel, and comprises an objective lens unit and a light propagation affecting device. The objective lens unit is accommodated in the illumination and collection channels, thereby defining a common optical path for propagation of illuminating light from the illumination channel toward an illuminating region in the measurement plane and for propagation of light returned from measurement plane to the collection channel. The light propagation affecting device comprises an apertured structure located in at least one of the illumination and collection channels, and configured to provide angular obscuration of light propagation path for blocking angular segments associated with light propagation from regions outside the illuminated region.
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公开(公告)号：US20190339056A1
公开(公告)日：2019-11-07
申请号：US16416296
申请日：2019-05-20
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： BOAZ BRILL , BORIS SHERMAN , IGOR TUROVETS
Abstract: A method and system are presented for monitoring measurement of parameters of patterned structures based on a predetermined fitting model. The method comprises: (a) providing data indicative of measurements in at least one patterned structure; and (b) applying at least one selected verification mode to said data indicative of measurements, said at least one verification mode comprising: I) analyzing the data based on at least one predetermined factor and classifying the corresponding measurement result as acceptable or unacceptable, II) analyzing the data corresponding to the unacceptable measurement results and determining whether one or more of the measurements providing said unacceptable result are to be disregarded, or whether one or more parameters of the predetermined fitting model are to be modified.
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公开(公告)号：US10372845B1
公开(公告)日：2019-08-06
申请号：US14927850
申请日：2015-10-30
Applicant: Nova Measuring Instruments Ltd.
Inventor： Ruslan Berdichevsky , Eyal Grubner , Shai Segev
Abstract: A method and system are presented for use in scatterometry analysis for a patterned structure. According to this technique, a model of a patterned structure is provided comprising a selected number of virtual segment data pieces indicative of a respective number of segments of the patterned structure along Z-axis through the structure. Each of the segment data pieces is processed for determining a matrix [Ωn] comprising Z-axis derivatives of electromagnetic fields' response of the segment to incident field based on Maxwell's equations' solution, and transforming this matrix [Ωn] into an approximated response matrix [∧n] corresponding to the electromagnetic field interaction between two different points spaced along the Z-axis. The transformation is preferably carried out by a GPU, and comprises embedding said matrix [Ωn] in a series expansion of said matrix exponential term [∧n]. Then, the approximated response matrices {[∧n]} for all the segment data pieces are multiplied for determining a general propagation matrix [∧], which is utilized to determine a scattering matrix for the patterned structure. The multiplication may also be performed by GPU.
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公开(公告)号：US20190154594A1
公开(公告)日：2019-05-23
申请号：US16231718
申请日：2018-12-24
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： GILAD BARAK , DANNY GROSSMAN , DROR SHAFIR , YOAV BERLATZKY , YANIR HAINICK
IPC: G01N21/956 , G01B9/02 , G01B11/06 , G01N21/88
Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.
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公开(公告)号：US10274435B2
公开(公告)日：2019-04-30
申请号：US15523896
申请日：2015-11-02
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Boris Levant , Yanir Hainick , Vladimir Machavariani , Roy Koret , Gilad Barak
IPC: G01N21/956 , G01B11/02 , G01N21/95
Abstract: A data analysis method and system are presented for use in determining one or more parameters of a patterned structure located on top of an underneath layered structure. According to this technique, input data is provided which includes first measured data PMD being a function ƒ of spectral intensity Iλ and phase φ, PMD=ƒ(Iλ;φ), corresponding to a complex spectral response of the underneath layered structure, and second measured data Smeas indicative of specular reflection spectral response of a sample formed by the patterned structure and the underneath layered structure. Also provided is a general function F describing a relation between a theoretical optical response Stheor of the sample and a modeled optical response Smodel of the patterned structure and the complex spectral response PMD of the underneath layered structure, such that Stheor=F(Smodel; PMD). The general function is then utilized for comparing the second measured data Smeas and the theoretical optical response Stheor, and determining parameter(s) of interest of the top structure.
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