Invention Grant
- Patent Title: Infrared radiation emission surface having a high thermal emissivity and a long life time and its manufacturing method
-
Application No.: US15694699Application Date: 2017-09-01
-
Publication No.: US10054489B2Publication Date: 2018-08-21
- Inventor: Emmanuel Ollier , Nicolas Dunoyer
- Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Applicant Address: FR Paris
- Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE AUX ENERGIES ALTERNATIVES
- Current Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE AUX ENERGIES ALTERNATIVES
- Current Assignee Address: FR Paris
- Agency: Baker & Hostetler LLP
- Priority: FR1658240 20160905
- Main IPC: G01J5/04
- IPC: G01J5/04 ; G01J5/00

Abstract:
An infrared IR radiation emission surface in a predetermined wavelength range comprises a substrate made of a material based on silicon carbide SiC, and an ensemble of texturing microstructures covering the exposed emission face of the substrate. Each microstructure is formed by a single protuberance, which is arranged on and integrally with the substrate. The microstructures have the same shape and the same dimensions, and are distributed over the face of the substrate in a bidimensional periodic pattern. The shape of each microstructure is smooth and regular, with a radius of curvature which varies continuously from the apex of the microstructure to the exposed emission face of the substrate.
Public/Granted literature
Information query