Invention Grant
- Patent Title: Sample holder and focused-ion-beam machining device provided therewith
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Application No.: US14890258Application Date: 2013-05-14
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Publication No.: US10062546B2Publication Date: 2018-08-28
- Inventor: Noriyuki Lee , Hiroyuki Yamamoto , Akira Sugawara
- Applicant: Hitachi, Ltd.
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- International Application: PCT/JP2013/063458 WO 20130514
- International Announcement: WO2014/184881 WO 20141120
- Main IPC: H01L37/00
- IPC: H01L37/00 ; H01J37/305 ; H01J37/317

Abstract:
To realize a focused-ion-beam machining apparatus capable of machining a thin sample with a wide area and a uniform film thickness and a needle-like sample with a sharp tip, in a focused-ion-beam machining apparatus including: an ion source (1); an electronic lens (3) focusing an ion beam extracted from the ion source (1) and irradiating the ion beam to a sample (5); and a sample holder (13) holding the sample (5), the sample holder (13) is provided with a shield electrode (7) arranged in a manner such as to cover the sample (5), and the sample (5) and the shield electrode (7) are insulated from each other in a manner such that voltages can be applied to them separately from each other.
Public/Granted literature
- US20160172158A1 SAMPLE HOLDER AND FOCUSED-ION-BEAM MACHINING DEVICE PROVIDED THEREWITH Public/Granted day:2016-06-16
Information query
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