Invention Grant
- Patent Title: Separation apparatus, separation system, and separation method
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Application No.: US13693151Application Date: 2012-12-04
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Publication No.: US10071544B2Publication Date: 2018-09-11
- Inventor: Osamu Hirakawa , Masaru Honda , Akira Fukutomi , Takeshi Tamura , Jiro Harada , Kazutaka Noda , Xavier Francois Brun
- Applicant: Tokyo Electron Limited , INTEL CORPORATION
- Applicant Address: JP Tokyo US CA Santa Clara
- Assignee: Tokyo Electron Limited,INTEL CORPORATION
- Current Assignee: Tokyo Electron Limited,INTEL CORPORATION
- Current Assignee Address: JP Tokyo US CA Santa Clara
- Agency: Posz Law Group, PLC
- Priority: JP2011-269258 20111208; JP2012-245474 20121107
- Main IPC: B32B38/10
- IPC: B32B38/10 ; H01L21/67 ; B32B43/00

Abstract:
A separation apparatus for separating a superposed substrate in which a processing target substrate and a supporting substrate are joined together with an adhesive, into the processing target substrate and the supporting substrate, includes: a first holding unit which holds the processing target substrate; a second holding unit which holds the supporting substrate; a moving mechanism which relatively moves the first holding unit or the second holding unit in a horizontal direction; a load measurement unit which measures a load acting on the processing target substrate and the supporting substrate when the processing target substrate and the supporting substrate are separated; and a control unit which controls the moving mechanism based on the load measured by the load measurement unit.
Public/Granted literature
- US20130146228A1 SEPARATION APPARATUS, SEPARATION SYSTEM, AND SEPARATION METHOD Public/Granted day:2013-06-13
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