Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US14890129Application Date: 2014-05-20
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Publication No.: US10073358B2Publication Date: 2018-09-11
- Inventor: Petrus Carolus Maria Frissen , Gerardus Lucien Mathildus Jansen , George Arie Jan De Fockert
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- International Application: PCT/EP2014/060280 WO 20140520
- International Announcement: WO2014/187792 WO 20141127
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20 ; H01F13/00 ; H02K41/03 ; H02K15/03 ; H02K41/02

Abstract:
A magnetization tool for post-assembly magnetization of a magnet assembly including a main coil, an end surface of the main coil configured to be positioned substantially parallel to an outer surface of the magnet assembly for magnetizing a magnetic pole of the magnet assembly, the main coil being configured to generate a magnetic field and a shielding arrangement positioned adjacent the main coil in a plane substantially parallel to the end surface of the main coil, whereby the shielding arrangement is configured to generate a shielding magnetic field, whereby a resulting magnetic field of the shielding magnetic field and the magnetic field is substantially only protruding the magnetic pole of the magnet assembly and directly adjacent magnetic poles of the magnet assembly such that the magnetic pole of the magnet assembly and the directly adjacent magnetic poles of the magnetic pole have a substantially opposite polarity.
Public/Granted literature
- US20160070181A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2016-03-10
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