Invention Grant
- Patent Title: Polymeric complex supporter with zero-valent metals and manufacturing method thereof
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Application No.: US14831888Application Date: 2015-08-21
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Publication No.: US10081007B2Publication Date: 2018-09-25
- Inventor: Yuan-Pang Sun
- Applicant: GeoNano Environmental Technology, INC.
- Applicant Address: TW Pingtung
- Assignee: GeoNano Environmental Technology, INC.
- Current Assignee: GeoNano Environmental Technology, INC.
- Current Assignee Address: TW Pingtung
- Agency: CKC & Partners Co., Ltd.
- Priority: TW100132459A 20110908
- Main IPC: B01J23/745
- IPC: B01J23/745 ; B01J20/30 ; B01J35/02 ; B01J23/89 ; B01J37/00 ; B05D1/00 ; C01B3/06 ; B01J20/28 ; B01J20/18 ; C01F1/00 ; B01J37/04 ; B01J37/02 ; B01J20/02 ; B01J20/20 ; B01J20/26 ; B01J20/32 ; C02F1/00 ; C02F1/28 ; C02F1/70 ; C02F101/20 ; C02F101/30 ; C02F101/32 ; C02F101/36

Abstract:
A zero-valent metal polymeric complex supporter (ZVM-PCS) is disclosed. PCS possesses porous surface and internal coralloid-like channel structure that can accommodate high amount of iron-containing materials and derivatives thereof. The surface pore size, porosity, hydrophilicity and internal coralloid-like channel structure of PCS can be tailored through the manufacturing process, with which PCS can be functioned as a regulator for the releasing of produced hydrogen, and also control the adsorption and reactions toward heavy metals and chlorinated volatile organic compounds in water. The released hydrogen from the ZVM-PCS can be applied to anaerobic bioremediation. Moreover, the ZVM-PCS can be developed as the filter materials that can be installed in a column or any storage for water and wastewater treatment, or even in a groundwater cut-off barrier for the cleanup of contamination. While the ZVM-PCS is synthesized as a film without openings, it can be used as the electromagnetic interference shielding material.
Public/Granted literature
- US20150352527A1 POLYMERIC COMPLEX SUPPORTER WITH ZERO-VALENT METALS AND MANUFACTURING METHOD THEREOF Public/Granted day:2015-12-10
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