Invention Grant
- Patent Title: Extreme ultraviolet light generating system
-
Application No.: US15912628Application Date: 2018-03-06
-
Publication No.: US10085334B2Publication Date: 2018-09-25
- Inventor: Takayuki Yabu
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01J1/04 ; G01J1/20 ; H05G2/00

Abstract:
An extreme ultraviolet light generating system repetitively outputs extreme ultraviolet light emitted by a target that turns into plasma by being irradiated with a pulsed laser beam. The extreme ultraviolet light generating system may include: a target supply unit that sequentially supplies the target to a plasma generating region set within a chamber, an actuator connected to a laser beam focusing system that focuses the pulsed laser beam output from a laser apparatus that adjusts the focusing position of the pulsed laser beam, an extreme ultraviolet light generation controller that controls the extreme ultraviolet light generating system to output extreme ultraviolet light based on a burst pattern, and an actuator controller that controls the actuator to compensate for shifts of the focusing position of the pulsed laser beam during a burst operation by feedforward control.
Public/Granted literature
- US20180199422A1 EXTREME ULTRAVIOLET LIGHT GENERATING SYSTEM Public/Granted day:2018-07-12
Information query
IPC分类: