Invention Grant
- Patent Title: Unevenness inspection system, unevenness inspection method, and unevenness inspection program
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Application No.: US14769384Application Date: 2014-02-18
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Publication No.: US10089754B2Publication Date: 2018-10-02
- Inventor: Satoshi Tomioka
- Applicant: SATURN LICENSING LLC
- Applicant Address: US NY New York
- Assignee: Saturn Licensing LLC
- Current Assignee: Saturn Licensing LLC
- Current Assignee Address: US NY New York
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-041573 20130304
- International Application: PCT/JP2014/053706 WO 20140218
- International Announcement: WO2014/136561 WO 20140912
- Main IPC: G06T7/90
- IPC: G06T7/90 ; G06T7/00 ; G06T7/44 ; G01J3/50 ; H04N17/04 ; G01N21/88 ; H04N9/07 ; G02F1/13

Abstract:
An unevenness inspection system includes an image pickup section configured to acquire a picked-up image of an inspection target, an image generation section configured to generate a color-unevenness inspection image and a luminance-unevenness inspection image, based on the picked-up image, a calculation section configured to use both of the color-unevenness inspection image and the luminance-unevenness inspection image to calculate an evaluation parameter, and an inspection section configured to use the calculated evaluation parameter to perform unevenness inspection. The image generation section generates the color-unevenness inspection image and the luminance-unevenness inspection image, based on a filter-processed color-component image and a filter-processed luminance-component image. The calculation section calculates the evaluation parameter in consideration of unevenness visibility with respect to both of color and luminance.
Public/Granted literature
- US20160011121A1 UNEVENNESS INSPECTION SYSTEM, UNEVENNESS INSPECTION METHOD, AND UNEVENNESS INSPECTION PROGRAM Public/Granted day:2016-01-14
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