Invention Grant
- Patent Title: Diagnosis method, charged particle beam lithography apparatus, and recording medium
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Application No.: US15437514Application Date: 2017-02-21
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Publication No.: US10109454B2Publication Date: 2018-10-23
- Inventor: Kei Hasegawa , Hayato Kimura
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-032249 20160223
- Main IPC: H01J37/22
- IPC: H01J37/22 ; H01J37/317 ; H01J37/302

Abstract:
Disclosed is a method of diagnosing a conversion process for converting a format of image data including unit data corresponding to charged particle beams into a format suitable for an aperture array, the aperture array having a plurality of controllers provided to match a plurality of the charged particle beams to control the charged particle beams, and a driver configured to drive the controllers. The method includes: extracting the unit data having an identical first rank based on an arrangement of the unit data in the image data from the unit data of each block including a predetermined number of the unit data and calculating a first checksum of each of the first rank; extracting the unit data having an identical second rank after the conversion process from the unit data of each block and calculating a second checksum of each of the second rank; and comparing the first and second checksums.
Public/Granted literature
- US20170243714A1 DIAGNOSIS METHOD, CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS, AND RECORDING MEDIUM Public/Granted day:2017-08-24
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