Invention Grant
- Patent Title: Silicon-containing underlayers
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Application No.: US15254935Application Date: 2016-09-01
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Publication No.: US10114288B2Publication Date: 2018-10-30
- Inventor: Charlotte A. Cutler , Suzanne M. Coley , Owendi Ongayi , Christopher P. Sullivan , Paul J. LaBeaume , Li Cui , Shintaro Yamada , Mingqi Li , James F. Cameron
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent S. Matthew Cairns
- Main IPC: G03F7/11
- IPC: G03F7/11 ; G03F7/075 ; C08F20/14 ; C08F20/28 ; C08F20/32 ; C08F24/00 ; C08G67/00 ; C08G73/12 ; C08G77/04 ; C09D5/20 ; C09D183/04 ; G03F7/16 ; G03F7/20 ; G03F7/30 ; G03F7/42 ; C08F20/10 ; C08F220/14 ; C08F220/20 ; C08F220/24 ; C08F222/06 ; C08F222/40 ; C08F230/08 ; C08F220/18 ; C08F220/28 ; C08F220/32
Abstract:
Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.
Public/Granted literature
- US20180059547A1 SILICON-CONTAINING UNDERLAYERS Public/Granted day:2018-03-01
Information query
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