Invention Grant
- Patent Title: Method and apparatus for controlling a magnetic field in a plasma chamber
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Application No.: US15437757Application Date: 2017-02-21
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Publication No.: US10115566B2Publication Date: 2018-10-30
- Inventor: Steven Lane , Tza-Jing Gung , Kartik Ramaswamy , Travis Koh , Joseph F. Aubuchon , Yang Yang
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
Methods and apparatus for controlling a magnetic field in a plasma chamber are provided herein. In some embodiments, a process chamber liner may include a cylindrical body, an inner electromagnetic cosine-theta (cos θ) coil ring including a first plurality of inner coils embedded in the body and configured to generate a magnetic field in a first direction, and an outer electromagnetic cosine-theta (cos θ) coil ring including a second plurality of outer coils embedded in the body and configured to generate a magnetic field in a second direction orthogonal to the first direction, wherein the outer electromagnetic cos θ coil ring is disposed concentrically about the inner electromagnetic cos θ coil ring.
Public/Granted literature
- US20170162365A1 METHOD AND APPARATUS FOR CONTROLLING A MAGNETIC FIELD IN A PLASMA CHAMBER Public/Granted day:2017-06-08
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