Invention Grant
- Patent Title: Testkey structure and method of measuring device defect or connection defect by using the same
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Application No.: US15480388Application Date: 2017-04-06
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Publication No.: US10145889B2Publication Date: 2018-12-04
- Inventor: Kuei-Sheng Wu , Wen-Jung Liao , Wen-Shan Hsiao
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Main IPC: G01R31/26
- IPC: G01R31/26

Abstract:
A testkey structure including the following components is provided. A fin structure is disposed on a substrate and stretches along a first direction. A first gate structure and a second gate structure are disposed on the fin structure and stretch along a second direction. A first common source region is disposed in the fin structure between the first gate structure and the second gate structure. A first drain region is disposed in the fin structure at a side of the first gate structure opposite to the first common source region. A second drain region disposed in the fin structure at a side of the second gate structure opposite to the first common source region. A testkey structure is symmetrical along a horizontal line crossing the first common source region. The present invention further provides a method of measuring device defect or connection defect by using the same.
Public/Granted literature
- US20180292449A1 TESTKEY STRUCTURE AND METHOD OF MEASURING DEVICE DEFECT OR CONNECTION DEFECT BY USING THE SAME Public/Granted day:2018-10-11
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