Invention Grant
- Patent Title: Semiconductor device and a method of manufacturing thereof
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Application No.: US15459310Application Date: 2017-03-15
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Publication No.: US10170440B2Publication Date: 2019-01-01
- Inventor: Shih-An Liao , Shau-Yi Chen , Ming-Chi Hsu , Chun-Hung Liu , Min-Hsun Hsieh
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Marques IP Law Office, PLLC
- Agent Juan Carlos A. Marquez
- Priority: TW105107908A 20160315
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/00 ; H01L33/62 ; H01L33/30 ; H01L33/64

Abstract:
A semiconductor device comprises a semiconductor die, comprising a stacking structure, a first bonding pad, and a second bonding pad on a top surface of the stacking structure, wherein a shortest distance between the first bonding pad and the second bonding pad is less than 150 μm; a carrier comprising a connecting surface; a third bonding pad and a fourth bonding pad on the connecting surface of the carrier; and a conductive connecting layer comprising a current conductive area between the first bonding pad and the third bonding pad and between the second bonding pad and the fourth bonding pad.
Public/Granted literature
- US20170271290A1 SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THEREOF Public/Granted day:2017-09-21
Information query
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