Invention Grant
- Patent Title: Mask and masking assembly
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Application No.: US15491351Application Date: 2017-04-19
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Publication No.: US10170731B2Publication Date: 2019-01-01
- Inventor: Bum Mo Ahn , Seung Ho Park , Sung Hyun Byun
- Applicant: Point Engineering Co., Ltd.
- Applicant Address: KR Asan-si, Chungcheongnam-do
- Assignee: Point Engineering Co., Ltd.
- Current Assignee: Point Engineering Co., Ltd.
- Current Assignee Address: KR Asan-si, Chungcheongnam-do
- Agency: Sunstein Kann Murphy & Timbers LLP
- Priority: KR10-2016-0049146 20160422
- Main IPC: H01L51/00
- IPC: H01L51/00 ; H01L51/50 ; H01L51/56
Abstract:
A mask for forming a pattern on a substrate is provided. The mask includes an anodic oxide film formed by anodizing metal, at least one transmission hole configured to vertically penetrate the anodic oxide film and formed in a corresponding relationship with the pattern, a plurality of pores formed in the anodic oxide film so as to have a smaller diameter than the transmission hole, and a magnetic material provided in each of the pores.
Public/Granted literature
- US20170309868A1 Mask and Masking Assembly Public/Granted day:2017-10-26
Information query
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