Invention Grant
- Patent Title: Structure and methodology for a shadow mask having hollow high aspect ratio projections
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Application No.: US15261648Application Date: 2016-09-09
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Publication No.: US10172558B2Publication Date: 2019-01-08
- Inventor: Sandeep Negi , Rajmohan Bhandari , Mobashir Hasan Shandi
- Applicant: University of Utah Research Foundation
- Applicant Address: US UT Salt Lake City
- Assignee: University of Utah Research Foundation
- Current Assignee: University of Utah Research Foundation
- Current Assignee Address: US UT Salt Lake City
- Agency: Thrope North & Western, LLP
- Main IPC: A61B5/00
- IPC: A61B5/00 ; B81B1/00 ; B81C1/00 ; A61B5/04 ; A61N1/05 ; C25D5/34 ; C25D1/00 ; C25D1/08

Abstract:
A high aspect ratio shadow mask and a method of making and using the high aspect ratio shadow mask can provide multiple conductive trace pathways along high aspect ratio electrodes. The high aspect ratio shadow mask can include a substantially planar base layer and a plurality of hollow high aspect ratio projections extending from the substantially planar base layer. The high aspect ratio shadow mask can further include a plurality of openings along the hollow projections which define trace deposition patterns.
Public/Granted literature
- US20170071540A1 HIGH ASPECT RATIO SHADOW MASK AND A METHOD OF MAKING AND USING THE SAME Public/Granted day:2017-03-16
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