Invention Grant
- Patent Title: Optoelectronic device and the manufacturing method thereof
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Application No.: US15709810Application Date: 2017-09-20
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Publication No.: US10205059B2Publication Date: 2019-02-12
- Inventor: Chun-Yu Lin , Yung-Fu Chang , Rong-Ren Lee , Kuo-Feng Huang , Cheng-Long Yeh , Yi-Ching Lee , Ming-Siang Huang , Ming-Tzung Liou
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: Epistar Corporation
- Current Assignee: Epistar Corporation
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/38 ; H01L33/44 ; H01L33/42 ; H01L33/40 ; H01L33/22 ; H01L33/06

Abstract:
The present disclosure is related to an optoelectronic device comprising a semiconductor stack comprising a first surface and a second surface opposite to the first surface; a first contact layer on the first surface; and a second contact layer on the second surface, wherein the second contact layer is not overlapped with the first contact layer in a vertical direction; wherein the second contact layer comprises a plurality of dots separating from each other and formed of semiconductor material.
Public/Granted literature
- US20180033918A1 OPTOELECTRONIC DEVICE AND THE MANUFACTURING METHOD THEREOF Public/Granted day:2018-02-01
Information query
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