Invention Grant
- Patent Title: Multivalence semiconductor photocatalytic materials
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Application No.: US15510621Application Date: 2015-09-11
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Publication No.: US10213780B2Publication Date: 2019-02-26
- Inventor: Ekambaram Sambandan , Bin Zhang
- Applicant: NITTO DENKO CORPORATION
- Applicant Address: JP Osaka
- Assignee: Nitto Denko Corporation
- Current Assignee: Nitto Denko Corporation
- Current Assignee Address: JP Osaka
- Agency: K&L Gates LLP
- Agent Louis C. Cullman; Hal Gibson
- International Application: PCT/US2015/049805 WO 20150911
- International Announcement: WO2016/040875 WO 20160317
- Main IPC: B01J35/00
- IPC: B01J35/00 ; B01J37/08 ; B01J37/16 ; B01J21/06 ; B01J23/72 ; B01J23/75 ; A61L9/18 ; B01D53/00 ; B01J23/02 ; B01J23/68 ; B01J27/18 ; B01J37/04 ; C02F1/32 ; C02F1/72 ; C02F101/32

Abstract:
Described herein are heterogeneous materials comprising a p-type semiconductor comprising two metal oxide compounds of the same metal in two different oxidation states and an n-type semiconductor having a deeper valence band than the p-type semiconductor valence bands, wherein the semiconductor types are in ionic communication with each other. The heterogeneous materials enhance photocatalytic activity.
Public/Granted literature
- US20170291170A1 MULTIVALENCE SEMICONDUCTOR PHOTOCATALYTIC MATERIALS Public/Granted day:2017-10-12
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