Invention Grant
- Patent Title: Secondary ion mass spectroscopic method, mass spectrometer and uses thereof
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Application No.: US15692077Application Date: 2017-08-31
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Publication No.: US10215719B2Publication Date: 2019-02-26
- Inventor: Sven Kayser
- Applicant: ION-TOF TECHNOLOGIES GMBH
- Applicant Address: DE Muenster
- Assignee: ION-TOF TECHNOLOGIES GmbH
- Current Assignee: ION-TOF TECHNOLOGIES GmbH
- Current Assignee Address: DE Muenster
- Agency: Eckert Seamans Cherin & Mellott, LLC
- Agent Robert W. Morris
- Priority: EP16186930 20160902
- Main IPC: H01J49/40
- IPC: H01J49/40 ; H01J49/00 ; G01N23/2258 ; H01J49/14

Abstract:
In a secondary ion mass spectroscopic (SIMS) method, and a mass spectrometer for implementing the method, for depth-profiling analysis of alkali metals in a sample which comprises an insulating material or is an insulator. The sample is irradiated by an ion beam as an analysis beam for desorption of secondary ions from the uppermost layers, such that the surface of the sample is removed with the same or a further ion beam. The ion beam used for removal of the sample surface comprises essentially gas clusters or consists of gas clusters.
Public/Granted literature
- US20180067062A1 SECONDARY ION MASS SPECTROSCOPIC METHOD, MASS SPECTROMETER AND USES THEREOF Public/Granted day:2018-03-08
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