Invention Grant
- Patent Title: Focus monitoring arrangement and inspection apparatus including such an arrangement
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Application No.: US15379918Application Date: 2016-12-15
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Publication No.: US10215954B2Publication Date: 2019-02-26
- Inventor: Gerbrand Van Der Zouw
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP15201344 20151218
- Main IPC: G02B7/28
- IPC: G02B7/28 ; G01N21/47 ; G02B7/32 ; G02B21/24 ; G03F9/00

Abstract:
A focus monitoring arrangement (1000) is provided for a scatterometer or other optical system. A first focus sensor (510) provides a first focus signal (S1-S2) indicating focus relative to a first reference distance (z1). A second focus sensor (1510) for providing a second focus signal (C1-C2) indicating focus relative to a second reference distance (z2). A processor (1530) calculates a third focus signal by combining the first focus signal and the second focus signal. By varying the proportions of the first and second focus signals in calculating the third focus signal, an effective focus offset can be varied electronically, without moving elements.
Public/Granted literature
- US20170176714A1 Focus Monitoring Arrangement and Inspection Apparatus Including Such an Arrangement Public/Granted day:2017-06-22
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