Invention Grant
- Patent Title: Continuous-wave laser-sustained plasma illumination source
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Application No.: US15064294Application Date: 2016-03-08
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Publication No.: US10217625B2Publication Date: 2019-02-26
- Inventor: Ilya Bezel , Anatoly Shchemelinin , Eugene Shifrin , Matthew Panzer
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: H01J65/04
- IPC: H01J65/04 ; H05G2/00

Abstract:
An optical system for generating broadband light via light-sustained plasma formation includes a chamber, an illumination source, a set of focusing optics, and a set of collection optics. The chamber is configured to contain a buffer material in a first phase and a plasma-forming material in a second phase. The illumination source generates continuous-wave pump illumination. The set of focusing optics focuses the continuous-wave pump illumination through the buffer material to an interface between the buffer material and the plasma-forming material in order to generate a plasma by excitation of at least the plasma-forming material. The set of collection optics receives broadband radiation emanated from the plasma.
Public/Granted literature
- US10163620B2 Continuous-wave laser-sustained plasma illumination source Public/Granted day:2018-12-25
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